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Focusing characteristic of chromium atoms under elliptical standing wave

Zhang Wen-Tao Zhu Bao-Hua Xiong Xian-Ming

Focusing characteristic of chromium atoms under elliptical standing wave

Zhang Wen-Tao, Zhu Bao-Hua, Xiong Xian-Ming
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  • Received Date:  21 November 2008
  • Accepted Date:  02 April 2009
  • Published Online:  20 December 2009

Focusing characteristic of chromium atoms under elliptical standing wave

  • 1. 桂林电子科技大学电子工程学院,桂林 541004

Abstract: Direct-write atom lithography is a new technique in which resonant light is used to pattern an atomic beam and the nanostructures are formed when the atoms are deposited on the substrate. The characteristics of chromium atoms deposit on a substrateare are discussed. We simulated and analysed the characteristics of nanostructure under different laser power and on different y-plane. At the same time, the characteristics of nanostructure are analysed with respect to the effects of atomic beam divergence, the resulting full width at half maximum and contrast are shown under respective conditions.

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