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Analysis on the ionization of high power pulsed unbalanced magnetron sputtering powered by direct current

Mu Zong-Xin Mu Xiao-Dong Wang Chun Jia Li Dong Chuang

Analysis on the ionization of high power pulsed unbalanced magnetron sputtering powered by direct current

Mu Zong-Xin, Mu Xiao-Dong, Wang Chun, Jia Li, Dong Chuang
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  • Abstract views:  3601
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  • Received Date:  23 February 2010
  • Accepted Date:  23 March 2010
  • Published Online:  15 January 2011

Analysis on the ionization of high power pulsed unbalanced magnetron sputtering powered by direct current

  • 1. Key Laboratory of M7aterials Modification by Laser, Ion and Electron Beams (Dalian University of Technology), Ministry of Education, School of Physics and Optoelectronic technology, Dalian University of Technology, Dalian 116024,China

Abstract: High Power impulse Unbalanced Magnetron Sputtering has been coupled to a direct current source (dc-HPPUMS or dc-HiPUMS). A coaxial coil and an attached hollow cathode were applied to control discharge properties and improve pulsed power density. A large extent breakdown was induced for avalanche discharge mechanism. The magnetic trap on sputtering target traps the secondary electrons excited by the avalanche and forms a drift current in magnetic trap. The peak pulse current density is higher than 100 A/cm2 with a pulse frequency less than 40 Hz. The space charge limited condition controls the discharge for plasma far away from equilibrium. The discharge theory was taken to describe the high ionization mechanism in dc-HPPUMS discharge. The parameters deduced from Child law agree with the experimental results.

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