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Research of subwavelength grating based on multilayer films structure

Liang Gao-Feng Zhao Qing Chen Xin Wang Chang-Tao Zhao Ze-Yu Luo Xian-Gang

Research of subwavelength grating based on multilayer films structure

Liang Gao-Feng, Zhao Qing, Chen Xin, Wang Chang-Tao, Zhao Ze-Yu, Luo Xian-Gang
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  • Received Date:  09 June 2011
  • Accepted Date:  28 May 2012
  • Published Online:  05 May 2012

Research of subwavelength grating based on multilayer films structure

  • 1. School of Physical Electronics, University of Electronic Science and Technology of China, Chengdu 610054, China;
  • 2. State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optical and Electronics,Chinese Academy of Science, Chengdu 610209, China
Fund Project:  Project supported by the National Basic Research Program of China (Grant No. 2011CB301800-G), the International Cooperation Project, China (Grand No. 2011DFA63190), and the State Key Laboratory Foundation for Micro-Fabrication Optical Technology of China (Grant No. 201101445).

Abstract: Based on the theory of suface plasmon resonance and the special nano-optical effect of metal-dielectric composite, we study super-resolution photolithography using multilayer films. The main point is to use 365 nm exposal light to realize super-resolution imaging by using a mask with a period of 230 nm and linewidth of 100 nm. We discuss the selection of the parameters multi-film with equal thickness, and achieve a sufficient contrast and high intensity through numerical simulation, then verify the obtained results by the plasmon nanolithography technique. Choosing the best scheme, we achieve large-area super-resolution images with the subwavelength structure.

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