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Numerical simulation on the thermal deposition of optical surface irradiated by low energy ion beam in ion beam figuring

Yuan Zheng Dai Yi-Fan Xie Xu-Hui Zhou Lin

Numerical simulation on the thermal deposition of optical surface irradiated by low energy ion beam in ion beam figuring

Yuan Zheng, Dai Yi-Fan, Xie Xu-Hui, Zhou Lin
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  • Based on energy deposition theory of Sigmund, the model of thickness of energy perturbation layer caused by low energy ion bombarding optical surface is built up. Beam current density on the optical surface is obtained by theory analysis, and the model of thermal deposition caused by low energy ion bombarding optical surface is built up. TRIM program is used to simulate the collision between low energy ions and atoms on the optical surface. And then, contributions to the thermal deposition and energy perturbation layer thickness from parameters such as ion energy, ion type and incidence angle are discussed. Finally, by taking the thermal quantity of deposited workpiece as a heat source in ANSYS, temperature field, thermal gradient field and stress field of the workpiece are obtained. The temperature and thermal gradient of the surface radiated by ion beam each present a Gaussian profile, and decrease along the radius from the center to the edge. The stress on the surface is a compressive stress within the radius of Half Maxim, and it is a tension-tension stress from the radius of Half Maxim to the edge.
    • Funds: Project supported by the National Natural Science Foundation of China (Grant Nos. 91023042, 51105370).
    [1]

    Marcel D, Michael Z, Frank A 2010 Proc. SPIE 7591 75910Y

    [2]

    Shanbhag P M, Feinberg M R, Sandri G 2000 Appl. Opt. 39 599

    [3]

    Fujiwara K, Pahlovy S A, Miyamoto I 2011 Microelectronic Eng. 88 2527

    [4]

    Gailly P, Collette J P, Renson L, Tock J P 1999 Proc. SPIE 3739 124

    [5]

    Jiao H F, Cheng X B, Lu J T, Bao G H, Liu Y L, Ma B, He P F, Wang Z S 2011 Appl. Opt. 50 C309

    [6]

    Park J H, Lee K S, Kim J N 1998 J. Phys.: Condens. Matter 10 9593

    [7]

    Olivier B. Duchemin 2001 Ph. D. Dissertation (Pasadena: California Institute of Technology)

    [8]

    Sigmund P J 1973 Mater. Sci. 8 1545

    [9]

    Liu J S 1995 The Technology and Application of Ion Beam (Beijing: National Defence Industry Press) p50 (in Chinese) [刘金声 1995 离子束技术及应用(北京: 国防工业出版社)第50页]

    [10]

    Wu D, Gong Y, Liu J Y, Wang X G 2005 Acta Phys. Sin. 54 1636 (in Chinese) [吴 迪, 宫 野, 刘金远, 王晓刚 2005 物理学报 54 1636]

    [11]

    Wu D, Gong Y, Lei K M, Liu J Y, Wang X G, Liu Y, Ma T C 2010 Acta Phys. Sin. 59 4826 (in Chinese) [吴 迪, 宫 野, 雷凯明, 刘金远, 王晓刚, 刘 悦, 马腾才 2010 物理学报 59 4826]

    [12]

    Gong Y, Zhang J H, Wang X D, Wu D, Liu J Y, Liu Y, Wang X G, Ma T C 2008 Acta Phys. Sin. 57 5095(in Chinese) [宫 野, 张建红, 王晓东, 吴 迪, 刘金远, 刘 悦, 王晓刚, 马腾才 2008 物理学报 57 5095]

    [13]

    Hansel T, Nickel A, Schindler A 2008 Optical Fabrication and Testing (OFT) JWD6

    [14]

    Wang G H 1988 Physics of Reciprocity Between Particle and Solid (Beijing: Science Press) p7 (in Chinese) [王广厚 1988 粒子与固体相互作用物理学(北京:科学出版社)第7页]

  • [1]

    Marcel D, Michael Z, Frank A 2010 Proc. SPIE 7591 75910Y

    [2]

    Shanbhag P M, Feinberg M R, Sandri G 2000 Appl. Opt. 39 599

    [3]

    Fujiwara K, Pahlovy S A, Miyamoto I 2011 Microelectronic Eng. 88 2527

    [4]

    Gailly P, Collette J P, Renson L, Tock J P 1999 Proc. SPIE 3739 124

    [5]

    Jiao H F, Cheng X B, Lu J T, Bao G H, Liu Y L, Ma B, He P F, Wang Z S 2011 Appl. Opt. 50 C309

    [6]

    Park J H, Lee K S, Kim J N 1998 J. Phys.: Condens. Matter 10 9593

    [7]

    Olivier B. Duchemin 2001 Ph. D. Dissertation (Pasadena: California Institute of Technology)

    [8]

    Sigmund P J 1973 Mater. Sci. 8 1545

    [9]

    Liu J S 1995 The Technology and Application of Ion Beam (Beijing: National Defence Industry Press) p50 (in Chinese) [刘金声 1995 离子束技术及应用(北京: 国防工业出版社)第50页]

    [10]

    Wu D, Gong Y, Liu J Y, Wang X G 2005 Acta Phys. Sin. 54 1636 (in Chinese) [吴 迪, 宫 野, 刘金远, 王晓刚 2005 物理学报 54 1636]

    [11]

    Wu D, Gong Y, Lei K M, Liu J Y, Wang X G, Liu Y, Ma T C 2010 Acta Phys. Sin. 59 4826 (in Chinese) [吴 迪, 宫 野, 雷凯明, 刘金远, 王晓刚, 刘 悦, 马腾才 2010 物理学报 59 4826]

    [12]

    Gong Y, Zhang J H, Wang X D, Wu D, Liu J Y, Liu Y, Wang X G, Ma T C 2008 Acta Phys. Sin. 57 5095(in Chinese) [宫 野, 张建红, 王晓东, 吴 迪, 刘金远, 刘 悦, 王晓刚, 马腾才 2008 物理学报 57 5095]

    [13]

    Hansel T, Nickel A, Schindler A 2008 Optical Fabrication and Testing (OFT) JWD6

    [14]

    Wang G H 1988 Physics of Reciprocity Between Particle and Solid (Beijing: Science Press) p7 (in Chinese) [王广厚 1988 粒子与固体相互作用物理学(北京:科学出版社)第7页]

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  • Received Date:  16 April 2012
  • Accepted Date:  14 June 2012
  • Published Online:  20 November 2012

Numerical simulation on the thermal deposition of optical surface irradiated by low energy ion beam in ion beam figuring

  • 1. School of Mechatronic Engineering and Automation, National University of Defense Technology, Changsha 410073, China
Fund Project:  Project supported by the National Natural Science Foundation of China (Grant Nos. 91023042, 51105370).

Abstract: Based on energy deposition theory of Sigmund, the model of thickness of energy perturbation layer caused by low energy ion bombarding optical surface is built up. Beam current density on the optical surface is obtained by theory analysis, and the model of thermal deposition caused by low energy ion bombarding optical surface is built up. TRIM program is used to simulate the collision between low energy ions and atoms on the optical surface. And then, contributions to the thermal deposition and energy perturbation layer thickness from parameters such as ion energy, ion type and incidence angle are discussed. Finally, by taking the thermal quantity of deposited workpiece as a heat source in ANSYS, temperature field, thermal gradient field and stress field of the workpiece are obtained. The temperature and thermal gradient of the surface radiated by ion beam each present a Gaussian profile, and decrease along the radius from the center to the edge. The stress on the surface is a compressive stress within the radius of Half Maxim, and it is a tension-tension stress from the radius of Half Maxim to the edge.

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