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Photo-detachment of hydrogen negative ion in a magnetic field near a dielectric surface

Tang Tian-Tian Wang De-Hua Huang Kai-Yun Wang Shan-Shan

Photo-detachment of hydrogen negative ion in a magnetic field near a dielectric surface

Tang Tian-Tian, Wang De-Hua, Huang Kai-Yun, Wang Shan-Shan
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  • Received Date:  12 June 2011
  • Accepted Date:  30 June 2011
  • Published Online:  20 March 2012

Photo-detachment of hydrogen negative ion in a magnetic field near a dielectric surface

    Corresponding author: Wang De-Hua, jnwdh@sohu.com
  • 1. College of Physics, Ludong University, Yantai 264025, China
Fund Project:  Project supported by the National Natural Science Foundation of China (Grant Nos. 11074104, 10604045) and the High Educational Science and Technology Program of Shandong Province, China (Grant No. J09LA02).

Abstract: Using the closed orbit theory, we study the photo-detachment of H- in a magnetic field near a dielectric surface. The photo-detachment cross section of this system is also derived and calculated. It is found that the photo-detachment cross section is not only related to the magnetic field strength, but also depends on the dielectric constant. For a given ion-surface distance and dielectric constant, with the increase of the magnetic field strength, the number of the closed orbits increases greatly and the oscillatory structure in the photo-detachment cross section becomes much more complicated. On the other hand, for a given magnetic field strength, the dielectric constant also has a great influence on the photo-detachment process of negative ion. Above the ionization threshold, the photo-detachment cross section becomes oscillatory. With the increase of the dielectric constant, the oscillatory structure in the cross-section becomes much more complicated. Therefore we can control the photo-detachment of negative ion by changing the magnetic field strength and the dielectric constant. This study provides a new understanding of the photo-detachment process of negative ion in the presence of external fields and surfaces.

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