Search

Article

x

留言板

尊敬的读者、作者、审稿人, 关于本刊的投稿、审稿、编辑和出版的任何问题, 您可以本页添加留言。我们将尽快给您答复。谢谢您的支持!

姓名
邮箱
手机号码
标题
留言内容
验证码

Enhanced discharge of high power pulsed magnetron sputtering coupling with high voltage

Wu Zhong-Zhen Tian Xiu-Bo Pan Feng Ricky K. Y. Fu Paul K. Chu

Enhanced discharge of high power pulsed magnetron sputtering coupling with high voltage

Wu Zhong-Zhen, Tian Xiu-Bo, Pan Feng, Ricky K. Y. Fu, Paul K. Chu
PDF
Get Citation
  • Plasma source ion implantation and deposition, as an effective technology to produce functional coatings with high adhesion and density, possesses the wide application prospect, especially in the deposition of coatings that work in high loading service conditions. The key component of this technology is the metal plasma source, which is now based on pulsed cathodic arc with complex source structure and magnetic filtration because of the macro-droplets in the ion flux. In this paper, we present another metal plasma source, high power pulsed magnetron sputtering (HPPMS), and investigate the discharge characteristics at different coupling high-voltages by optical emission spectroscopy. The results show that significant improvements are found in the discharge target current and main particles in the plasma. The improvement in gas discharge by the coupling high-voltage is greater than in metal discharge which could increase obviously in the self-sputtering stage with higher target voltage discharge. Last but not least, in this paper we discuss the discharge enhancing mechanism of coupling high-voltage. It is found that the self-excited glow discharge of coupling high-voltage, the hollow-cathodic effect induced by face-to-face negative voltages of HPPMS and coupling high-voltage, and the enhanced ambipolar diffusion of the coupling high-voltage can all play a considerable role in HPPMS discharge.
    • Funds: Project supported by the National Natural Science Foundation of China (Grant Nos. 51301004, U1330110) and the Shenzhen Science and Technology Research Grant, China (Grant Nos. SGLH20120928095706623, JCYJ20120614150338154, CXZZ20120829172325895).
    [1]

    Conrad J R, Castagna T, Am B 1986 Phys. Soc. 31 1479

    [2]

    Li X, Tang Z A, Ma G J, Wu Z M, Deng X L 2003 Chin. Phys. Lett. 20 692

    [3]

    Man B Y, Zhang Y H, L G H, Liu A H, Zhang Q G, Guzman L, Adami M, Miotello A 2005 Acta Phys. Sin. 54 837(in Chinese)[满宝元, 张运海, 吕国华, 刘爱华, 张庆刚, Guzman L, Adami M, Miotello A 2005 物理学报 54 837]

    [4]

    Bilek M M M, McKenziea D R, Tarranta R N, Limb S H M, McCulloch D G 2002 Surf. Coat. Technol. 156 136

    [5]

    Zhang G L, Wang J L, Liu Y F, Liu C Z, Yang S Z 2004 Chin. Phys. 13 1309

    [6]

    Liu J, Liu B W, Xia Y, Li C B, Liu S 2012 Acta Phys. Sin. 61 148102(in Chinese)[刘杰, 刘邦武, 夏洋, 李超波, 刘肃 2012 物理学报 61 148102]

    [7]

    Anders A 1997 Surf. Coat. Technol. 93 158

    [8]

    Anders S, Anders A, Dickinson M R, MacGilt R A, Brown I G 1996 Proc. of XVⅡth Int. Symp. Disch. El. Insul. Vacuum Berkeley, USA, July 2-6, 1996 p904

    [9]

    Kouznetsov V, Maca'k K, Schneider J M, Helmersson U, Petrov I 1999 Surf. Coat. Technol. 122 290

    [10]

    Bohlmark J, Gudmundsson J T, Alami J, Latteman M, Helmersson U 2005 IEEE Trans. Plasma Sci. 33 346

    [11]

    Bohlmark J, Lattemann M, Gudmundsson J T, Ehiasarian A P, Gonzalvo Y A, Brenning N, Helmersson U 2006 Thin Solid Films 515 1522

    [12]

    Horwat D, Anders A 2008 J. Phys. D: Appl. Phys. 41 135210

    [13]

    Ehiasarian A P, Gonzalvo Y A, Whitmore T D 2007 Plasma Processes Polym. 4 S309

    [14]

    Tian X B, Wu Z Z, Gong C Z 2010 China Patent 201010213894.4 2010-06 (in Chinese)[田修波, 吴忠振, 巩春志 2010 中国专利 201010213894.4 2010-06]

    [15]

    Wu Z Z, Tian X B, Shi J W, Gong C Z, Yang S Q, Chu P K 2011 Rev. Sci. Instrum. 69 033511

    [16]

    Wu Z Z, Tian X B, Gong C Z, Yang S Q 2013 Rare Metal Mater. Eng. 42 405 (in Chinese)[吴忠振, 田修波, 巩春志, 杨士勤2013 稀有金属材料与工程 42 405]

    [17]

    Wu Z Z, Tian X B, Wang Z M, Gong C Z, Yang S Q, Tan C M 2011 Appl. Surf. Sci. 258 242

    [18]

    Duan W Z 2010 M.S. Dissertation (Harbin: Harbin Institute of Technology) (in Chinese)[段伟赞 2010 硕士学位论文 (哈尔滨: 哈尔滨工业大学)]

    [19]

    Tian X B, Wu Z Z, Shi J W, Li X P, Gong C Z, Yang S Q 2010 Chin. Vac. 47 44 (in Chinese)[田修波, 吴忠振, 石经纬, 李希平, 巩春志, 杨士勤 2010 真空 47 44]

    [20]

    Carsten E, George C, Chan G, Buscher W, Hieftje G M 2008 Spectrochim. Acta B 7 619

    [21]

    Duan W Z 2011 M.S. Dissertation (Harbin: Harbin Institute of Technology) (in Chinese)[段伟赞 2011 硕士学位论文 (哈尔滨: 哈尔滨工业大学)]

    [22]

    Kirsch B, Hanamura S, Wineforder J D 1984 Spectrochim. Acta B 39 955

    [23]

    Poucques L D, Imbert J C, Boisse-Laporte C, Bretagne J, Ganciu M, Teul-Gay L, Touzeau M 2006 Czech. J. Phys. 56 B1300

    [24]

    Kadlec S 2007 Plasma Processes Polym. 4 S419

    [25]

    Gong C Z, Zhu Z T, Shi J W, Yang S Q, Tian X B, Chu P K 2010 Surf. Coat. Technol. 204 2996

    [26]

    Oks E, Anders A 2010 Rev. Sci. Instrum. 81 02B306

    [27]

    Wu Z Z, Tian X B, Wang Z M, Gong C Z, Yang S Q 2011 Chin. J. Vac. Sci. Technol. 31 459(in Chinese)[吴忠振, 田修波, 王泽明, 巩春志, 杨士勤 2011 真空科学与技术学报 31 459]

    [28]

    Mu Z X, Mu X D, Wang C, Jia L, Dong C 2011 Acta Phys. Sin. 60 015204(in Chinese)[牟宗信, 牟晓东, 王春, 贾莉, 董闯 2011 物理学报 60 015204]

    [29]

    Wang Z M 2010 M.S. Dissertation (Harbin: Harbin Institute of Technology) (in Chinese)[王泽明 2011 硕士学位论文 (哈尔滨: 哈尔滨工业大学)]

    [30]

    Anders A, Andersson J Ehiasarian A P 2007 J. Appl. Phys. 102 113303

    [31]

    Anders A 2010 J. Vac. Sci. Technol. A 28 783

    [32]

    Wu Z Z, Tian X B, Wei Y Q, Gong C Z, Yang S Q, Pan F, Chu P K 2013 Surf. Coat. Technol. 236 320

  • [1]

    Conrad J R, Castagna T, Am B 1986 Phys. Soc. 31 1479

    [2]

    Li X, Tang Z A, Ma G J, Wu Z M, Deng X L 2003 Chin. Phys. Lett. 20 692

    [3]

    Man B Y, Zhang Y H, L G H, Liu A H, Zhang Q G, Guzman L, Adami M, Miotello A 2005 Acta Phys. Sin. 54 837(in Chinese)[满宝元, 张运海, 吕国华, 刘爱华, 张庆刚, Guzman L, Adami M, Miotello A 2005 物理学报 54 837]

    [4]

    Bilek M M M, McKenziea D R, Tarranta R N, Limb S H M, McCulloch D G 2002 Surf. Coat. Technol. 156 136

    [5]

    Zhang G L, Wang J L, Liu Y F, Liu C Z, Yang S Z 2004 Chin. Phys. 13 1309

    [6]

    Liu J, Liu B W, Xia Y, Li C B, Liu S 2012 Acta Phys. Sin. 61 148102(in Chinese)[刘杰, 刘邦武, 夏洋, 李超波, 刘肃 2012 物理学报 61 148102]

    [7]

    Anders A 1997 Surf. Coat. Technol. 93 158

    [8]

    Anders S, Anders A, Dickinson M R, MacGilt R A, Brown I G 1996 Proc. of XVⅡth Int. Symp. Disch. El. Insul. Vacuum Berkeley, USA, July 2-6, 1996 p904

    [9]

    Kouznetsov V, Maca'k K, Schneider J M, Helmersson U, Petrov I 1999 Surf. Coat. Technol. 122 290

    [10]

    Bohlmark J, Gudmundsson J T, Alami J, Latteman M, Helmersson U 2005 IEEE Trans. Plasma Sci. 33 346

    [11]

    Bohlmark J, Lattemann M, Gudmundsson J T, Ehiasarian A P, Gonzalvo Y A, Brenning N, Helmersson U 2006 Thin Solid Films 515 1522

    [12]

    Horwat D, Anders A 2008 J. Phys. D: Appl. Phys. 41 135210

    [13]

    Ehiasarian A P, Gonzalvo Y A, Whitmore T D 2007 Plasma Processes Polym. 4 S309

    [14]

    Tian X B, Wu Z Z, Gong C Z 2010 China Patent 201010213894.4 2010-06 (in Chinese)[田修波, 吴忠振, 巩春志 2010 中国专利 201010213894.4 2010-06]

    [15]

    Wu Z Z, Tian X B, Shi J W, Gong C Z, Yang S Q, Chu P K 2011 Rev. Sci. Instrum. 69 033511

    [16]

    Wu Z Z, Tian X B, Gong C Z, Yang S Q 2013 Rare Metal Mater. Eng. 42 405 (in Chinese)[吴忠振, 田修波, 巩春志, 杨士勤2013 稀有金属材料与工程 42 405]

    [17]

    Wu Z Z, Tian X B, Wang Z M, Gong C Z, Yang S Q, Tan C M 2011 Appl. Surf. Sci. 258 242

    [18]

    Duan W Z 2010 M.S. Dissertation (Harbin: Harbin Institute of Technology) (in Chinese)[段伟赞 2010 硕士学位论文 (哈尔滨: 哈尔滨工业大学)]

    [19]

    Tian X B, Wu Z Z, Shi J W, Li X P, Gong C Z, Yang S Q 2010 Chin. Vac. 47 44 (in Chinese)[田修波, 吴忠振, 石经纬, 李希平, 巩春志, 杨士勤 2010 真空 47 44]

    [20]

    Carsten E, George C, Chan G, Buscher W, Hieftje G M 2008 Spectrochim. Acta B 7 619

    [21]

    Duan W Z 2011 M.S. Dissertation (Harbin: Harbin Institute of Technology) (in Chinese)[段伟赞 2011 硕士学位论文 (哈尔滨: 哈尔滨工业大学)]

    [22]

    Kirsch B, Hanamura S, Wineforder J D 1984 Spectrochim. Acta B 39 955

    [23]

    Poucques L D, Imbert J C, Boisse-Laporte C, Bretagne J, Ganciu M, Teul-Gay L, Touzeau M 2006 Czech. J. Phys. 56 B1300

    [24]

    Kadlec S 2007 Plasma Processes Polym. 4 S419

    [25]

    Gong C Z, Zhu Z T, Shi J W, Yang S Q, Tian X B, Chu P K 2010 Surf. Coat. Technol. 204 2996

    [26]

    Oks E, Anders A 2010 Rev. Sci. Instrum. 81 02B306

    [27]

    Wu Z Z, Tian X B, Wang Z M, Gong C Z, Yang S Q 2011 Chin. J. Vac. Sci. Technol. 31 459(in Chinese)[吴忠振, 田修波, 王泽明, 巩春志, 杨士勤 2011 真空科学与技术学报 31 459]

    [28]

    Mu Z X, Mu X D, Wang C, Jia L, Dong C 2011 Acta Phys. Sin. 60 015204(in Chinese)[牟宗信, 牟晓东, 王春, 贾莉, 董闯 2011 物理学报 60 015204]

    [29]

    Wang Z M 2010 M.S. Dissertation (Harbin: Harbin Institute of Technology) (in Chinese)[王泽明 2011 硕士学位论文 (哈尔滨: 哈尔滨工业大学)]

    [30]

    Anders A, Andersson J Ehiasarian A P 2007 J. Appl. Phys. 102 113303

    [31]

    Anders A 2010 J. Vac. Sci. Technol. A 28 783

    [32]

    Wu Z Z, Tian X B, Wei Y Q, Gong C Z, Yang S Q, Pan F, Chu P K 2013 Surf. Coat. Technol. 236 320

  • [1] Tribocorrosion performance of Nitrogen-doped diamond like carbon coating by high power impulse magnetron sputtering technique. Acta Physica Sinica, 2020, (): . doi: 10.7498/aps.69.20200021
    [2] Diagnosis of capacitively coupled plasma driven by pulse-modulated 27.12 MHz by using an emissive probe. Acta Physica Sinica, 2020, (): . doi: 10.7498/aps.69.20191864
    [3] Yang Jin, Chen Jun, Wang Fu-Di, Li Ying-Ying, Lü Bo, Xiang Dong, Yin Xiang-Hui, Zhang Hong-Ming, Fu Jia, Liu Hai-Qing, Zang Qing, Chu Yu-Qi, Liu Jian-Wen, Wang Xun-Yu, Bin Bin, He Liang, Wan Shun-Kuan, Gong Xue-Yu, Ye Min-You. Experimental investigation of lower hybrid current drive induced plasma rotation on the experimental advanced superconducting tokamak. Acta Physica Sinica, 2020, 69(5): 055201. doi: 10.7498/aps.69.20191716
    [4] Thermodynamics of Laser Plasma Removal of Micro and Nano Particles. Acta Physica Sinica, 2020, (): . doi: 10.7498/aps.69.20191933
    [5] Liu Jia-He, Lu Jia-Zhe, Lei Jun-Jie, Gao Xun, Lin Jing-Quan. Effect of ambient gas pressure on characteristics of air plasma induced by nanosecond laser. Acta Physica Sinica, 2020, 69(5): 057401. doi: 10.7498/aps.69.20191540
    [6] Zhang Ji-Ye, Zhang Jian-Wei, Zeng Yu-Gang, Zhang Jun, Ning Yong-Qiang, Zhang Xing, Qin Li, Liu Yun, Wang Li-Jun. Design of gain region of high-power vertical external cavity surface emitting semiconductor laser and its fabrication. Acta Physica Sinica, 2020, 69(5): 054204. doi: 10.7498/aps.69.20191787
    [7] The spring oscillator model degenerated into the coupled-mode theory by using secular perturbation theory. Acta Physica Sinica, 2020, (): . doi: 10.7498/aps.69.20191505
    [8] Zou Ping, Lv Dan, Xu Gui-Ying. Microstructure and thermoelectric property of (Bi1–xTbx)2(Te0.9Se0.1)3 fabricated by high pressure sintering technique. Acta Physica Sinica, 2020, 69(5): 057201. doi: 10.7498/aps.69.20191561
    [9] Yang Yong-Xia, Li Yu-Ye, Gu Hua-Guang. Synchronization transition from bursting to spiking and bifurcation mechanism of the pre-Bötzinger complex. Acta Physica Sinica, 2020, 69(4): 040501. doi: 10.7498/aps.69.20191509
    [10] Liu Wan-Xin, Chen Rui, Liu Yong-Jie, Wang Jun-Feng, Han Xiao-Tao, Yang Ming. A pulsed high magnetic field facility for electric polarization measurements. Acta Physica Sinica, 2020, 69(5): 057502. doi: 10.7498/aps.69.20191520
    [11] The physics-based model of AlGaN/GaN high electron mobility transistor outer fringing capacitances. Acta Physica Sinica, 2020, (): . doi: 10.7498/aps.69.20191931
    [12] Research on few-mode PAM regenerator based on nonlinear optical fiber loop mirror. Acta Physica Sinica, 2020, (): . doi: 10.7498/aps.69.20191858
    [13] Ren Xian-Li, Zhang Wei-Wei, Wu Xiao-Yong, Wu Lu, Wang Yue-Xia. Prediction of short range order in high-entropy alloys and its effect on the electronic, magnetic and mechanical properties. Acta Physica Sinica, 2020, 69(4): 046102. doi: 10.7498/aps.69.20191671
    [14] The influence of the secondary electron emission characteristic of dielectric materials on the microwave breakdown. Acta Physica Sinica, 2020, (): . doi: 10.7498/aps.69.20200026
    [15] Yin Yu-Ming, Zhao Ling-Ling. Effects of salt concentrations and pore surface structure on the water flow through rock nanopores. Acta Physica Sinica, 2020, 69(5): 054701. doi: 10.7498/aps.69.20191742
    [16] Anisotropic Dissipation in a Dipolar Bose-Einstein Condensate. Acta Physica Sinica, 2020, (): . doi: 10.7498/aps.69.20200025
    [17] Wu Yu-Ming, Ding Xiao, Wang Ren, Wang Bing-Zhong. Theoretical analysis of wide-angle metamaterial absorbers based on equivalent medium theory. Acta Physica Sinica, 2020, 69(5): 054202. doi: 10.7498/aps.69.20191732
    [18] Effect of Swift Heavy Ions Irradiation on the Microstructure and Current-Carrying Capability in YBa2Cu3O7-δ High Temperature Superconductor Films. Acta Physica Sinica, 2020, (): . doi: 10.7498/aps.69.20191914
    [19] Investigate the effect of source-drain conduction in single-event transient on nanoscale bulk fin field effect transistor. Acta Physica Sinica, 2020, (): . doi: 10.7498/aps.69.20191896
  • Citation:
Metrics
  • Abstract views:  697
  • PDF Downloads:  620
  • Cited By: 0
Publishing process
  • Received Date:  25 March 2014
  • Accepted Date:  13 May 2014
  • Published Online:  20 September 2014

Enhanced discharge of high power pulsed magnetron sputtering coupling with high voltage

  • 1. School of Advanced Materials, Peking University Shenzhen Graduate School, Shenzhen 518055, China;
  • 2. State Key Laboratory of Advanced Welding Production and Technology, Harbin Institute of Technology, Harbin 150001, China;
  • 3. Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong, China
Fund Project:  Project supported by the National Natural Science Foundation of China (Grant Nos. 51301004, U1330110) and the Shenzhen Science and Technology Research Grant, China (Grant Nos. SGLH20120928095706623, JCYJ20120614150338154, CXZZ20120829172325895).

Abstract: Plasma source ion implantation and deposition, as an effective technology to produce functional coatings with high adhesion and density, possesses the wide application prospect, especially in the deposition of coatings that work in high loading service conditions. The key component of this technology is the metal plasma source, which is now based on pulsed cathodic arc with complex source structure and magnetic filtration because of the macro-droplets in the ion flux. In this paper, we present another metal plasma source, high power pulsed magnetron sputtering (HPPMS), and investigate the discharge characteristics at different coupling high-voltages by optical emission spectroscopy. The results show that significant improvements are found in the discharge target current and main particles in the plasma. The improvement in gas discharge by the coupling high-voltage is greater than in metal discharge which could increase obviously in the self-sputtering stage with higher target voltage discharge. Last but not least, in this paper we discuss the discharge enhancing mechanism of coupling high-voltage. It is found that the self-excited glow discharge of coupling high-voltage, the hollow-cathodic effect induced by face-to-face negative voltages of HPPMS and coupling high-voltage, and the enhanced ambipolar diffusion of the coupling high-voltage can all play a considerable role in HPPMS discharge.

Reference (32)

Catalog

    /

    返回文章
    返回