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THE DELAY EFFECT OF PULSE AVALANCHE DISCHARGE PROCESSES OF XeCl LASER AT HIGH GAS PRESSURE

LOU QI-HONG

THE DELAY EFFECT OF PULSE AVALANCHE DISCHARGE PROCESSES OF XeCl LASER AT HIGH GAS PRESSURE

LOU QI-HONG
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  • Received Date:  28 August 1984
  • Published Online:  31 March 2005

THE DELAY EFFECT OF PULSE AVALANCHE DISCHARGE PROCESSES OF XeCl LASER AT HIGH GAS PRESSURE

  • 1. 中国科学院上海光学精密机械研究所

Abstract: We analysed the pulse avalanche discharge processes of XeCl laser at high gas pressure up to 10 atm. The influences of delay effect on the discharge formation time were discussed. By comparing the calaulated results with experimental data observed in the XeCl laser pulse avalanche discharge, the critical avalanche track length was obtained as ξ≌1 mm.

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