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Design and fabrication of sub-wavelength metal wire-grid and its application to experimental study of polarimetric imaging

Chen Wei-Li Jin Wei-Qi Kang Guo-Guo Tan Qiao-Feng Jin Guo-Fan Li Qun-Qing

Design and fabrication of sub-wavelength metal wire-grid and its application to experimental study of polarimetric imaging

Chen Wei-Li, Jin Wei-Qi, Kang Guo-Guo, Tan Qiao-Feng, Jin Guo-Fan, Li Qun-Qing
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  • Abstract views:  4692
  • PDF Downloads:  1240
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  • Received Date:  13 July 2009
  • Accepted Date:  18 March 2010
  • Published Online:  15 January 2011

Design and fabrication of sub-wavelength metal wire-grid and its application to experimental study of polarimetric imaging

  • 1. (1)School of Optoelectronic, Beijing Institute of Technology University, Beijing 100081, China; (2)State Key Laboratory of Precision Measurement Technology and Instrument, Tsinghua University, Beijing 100084, China; (3)Tsinghua-Foxconn Nanotechnology Research Center, Tsinghua University, Beijing 100084, China

Abstract: Metal wire-grid whose period is far less than the illuminating wavelength exhibits strong polarization selectivity within a large field of view over a wide wave length range. Thus it could be used as the polarization-controller in the polarimetric imaging system. For infrared polarimetric imaging system, an aluminum wire-grid on the CaF substrate with period of 200nm and depth of 100nm was designed based on effective medium theory. The calculation results demonstrate that the designed wire-grid has the extinction ratio larger than 35 dB within a field of view ±20° over both middle wave infrared (MWIR) (3—5 μm) and long wave infrared (LWIR) (8—12 μm). The aluminum wire-grid was fabricated by electron beam lithography, reactive ion etching and plasma stripping. A clear-cut polarimetric image was obtained when wire-grid was placed in front of a MWIR thermal infrared imager.

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