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Influence of working pressure on the state of H2/C4H8 glowing discharge plasma

Li Rui He Zhi-Bing Yang Xiang-Dong He Xiao-Shan Niu Zhong-Cai Jia Xiao-Qin

Influence of working pressure on the state of H2/C4H8 glowing discharge plasma

Li Rui, He Zhi-Bing, Yang Xiang-Dong, He Xiao-Shan, Niu Zhong-Cai, Jia Xiao-Qin
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  • The variations of the main positive ion components and their energies for the plasma of H2/C4H8 gas mixture under different working pressures are investigated using the glow discharge technique and plasma mass spectrometry diagnostic method, and the effects of work pressure on both the dissociation mechanism of the mixed gas H2/C4H8 and the forming process of the main positive are analyzed. The results show that both the intensity and energy of the C-H segment ions in H2/C4H8 plasma decrease with pressure increasing. The relative concentration of m/e 41(C3H5+) reaches a maximum when work pressure is 5 Pa. And when the pressure is 10 Pa, the relative concentration of m/e 39(C3H3+) is largest; when the pressures are 15 Pa and 20 Pa, the relative concentration of m/e 29 (C2H5+) is highest; when the pressure is 25 Pa, the relative concentration of m/e 57(C4H9+) is biggest. The component and its energy distribution of H2/C4H8 plasma are qualitatively analyzed. The results will serve as a reference to the optimization of parameters for glow plasma polymer coatings.
    • Funds: Project supported by the National Natural Science Foundation of China (Grant Nos. 10974139, 10964002).
    [1]

    Zhang Q, Yoon S F, Rusli, Yang H, Ahn J 1998 J. Apply. Phys. 83 1349

    [2]

    Gram R Q, Immesoete C K, Kim H, Forsley L 1988 J. Vac. Sci. Technol. A 6 2998

    [3]

    Zhang B L, He Z B, Wu W D, Liu X H, Yang X D 2009 Acta Phys. Sin. 58 4636 (in Chinese) [张宝玲, 何智兵, 吴卫东, 刘兴华, 杨向东 2009 物理学报 58 6436]

    [4]

    Ju J H, Xia Y B, Zhang W L, Wang L J, Shi W M, Huang Z M, Li Z F, Zheng G Z, Tang D Y 2000 Acta Phys. Sin. 11 2311 (in Chinese) [居建华, 夏义本, 张伟丽, 王林军, 史为民, 黄志明, 李志锋, 郑国珍, 汤定元 2000 物理学报 11 2311]

    [5]

    Nikroo A, Pontelandolfo J M, Castillo E R 2002 General atomics report GA-A23757

    [6]

    Mcquillan B W, Nikroo A, Steinman D A, Elsner F H, Czechowicz D G, Hoppe M L, Sixtus M, Miller W J 1997 Fusion Technology(USA) 31 381

    [7]

    Zhang Y, He Z B, Yan J C, Li P, Tang Y J 2011 Acta Phys. Sin. 60 6803 (in Chinese) [张颖, 何智兵, 闫建成, 李萍, 唐永建 2011 物理学报 60 6803]

    [8]

    Niu Z C, He Z B, Zhang Y, Wei J J, Liao G, Du K, Tang Y J 2012 Acta Phys. Sin. 61 6804 (in Chinese) [牛忠彩, 何智兵, 张颖, 韦建军, 廖国, 杜凯, 唐永建 2012 物理学报 61 6804]

    [9]

    Zheng S B, Hu J F, Guo S J, Hong M Y 1994 Plasma Diagnostics (Vol.1) (Beijing: Electronic Industry Press) p38 (in Chinese) [郑少白, 胡建芳, 郭淑静, 洪明苑 1994 等离子体诊断(上卷) (北京: 电子工业出版社) 第38页]

    [10]

    Ristein J, Stief R T, Ley L, Beyer J 1998 J. Appl. Phys. 84 3836

    [11]

    Zhang Q 2003 Modern Technique And Characterization Methods (Self-complied teaching materials by Sichuan University) p154 (in Chinese) [张倩 2003 近代测试技术及表征 (四川大学自编讲义) 第154页]

    [12]

    Zhao Y X, Sun X Y 2010 The Spectrum Analysis on Structure of Organic Molecules (Beijing: Science Press) p1 (in Chinese) [赵瑶兴, 孙祥玉 2010 有机分子结构光谱解析 (北京: 科学出版社) 第1页]

    [13]

    Benninghoven A 1994 Angew. Chem. Int Ed Engl. 33 1023

    [14]

    Zhao Y X, Sun X Y 2010 The Spectral Identification on Structure of Organic Molecules (2nd Ed.) (Beijing: Science Press) p16 (in Chinese) [赵瑶兴, 孙祥玉 2010 有机分子结构光谱鉴定(第二版) (北京: 科学出版社) 第16页]

    [15]

    VanLeyen D, Hagenhoff B, Niehuis E, Benninghoven A, Bletss I V, Hercules D M 1989 J. Vac. Sci. Technol. A7 1790

    [16]

    Hittle L R, Hercules D M 1994 Surf. Interface Anal. 21 217

    [17]

    Ohring M 1992 The Materials Science of Thin Films (New York: Academic Press) p451

    [18]

    Chapman B N 1980 Glow Discharge Process (New York: John Wiley & Sons) p21

    [19]

    Ryu H J, Kim S H, Hong S H 2000 Materials Science And Engineering 277 57

  • [1]

    Zhang Q, Yoon S F, Rusli, Yang H, Ahn J 1998 J. Apply. Phys. 83 1349

    [2]

    Gram R Q, Immesoete C K, Kim H, Forsley L 1988 J. Vac. Sci. Technol. A 6 2998

    [3]

    Zhang B L, He Z B, Wu W D, Liu X H, Yang X D 2009 Acta Phys. Sin. 58 4636 (in Chinese) [张宝玲, 何智兵, 吴卫东, 刘兴华, 杨向东 2009 物理学报 58 6436]

    [4]

    Ju J H, Xia Y B, Zhang W L, Wang L J, Shi W M, Huang Z M, Li Z F, Zheng G Z, Tang D Y 2000 Acta Phys. Sin. 11 2311 (in Chinese) [居建华, 夏义本, 张伟丽, 王林军, 史为民, 黄志明, 李志锋, 郑国珍, 汤定元 2000 物理学报 11 2311]

    [5]

    Nikroo A, Pontelandolfo J M, Castillo E R 2002 General atomics report GA-A23757

    [6]

    Mcquillan B W, Nikroo A, Steinman D A, Elsner F H, Czechowicz D G, Hoppe M L, Sixtus M, Miller W J 1997 Fusion Technology(USA) 31 381

    [7]

    Zhang Y, He Z B, Yan J C, Li P, Tang Y J 2011 Acta Phys. Sin. 60 6803 (in Chinese) [张颖, 何智兵, 闫建成, 李萍, 唐永建 2011 物理学报 60 6803]

    [8]

    Niu Z C, He Z B, Zhang Y, Wei J J, Liao G, Du K, Tang Y J 2012 Acta Phys. Sin. 61 6804 (in Chinese) [牛忠彩, 何智兵, 张颖, 韦建军, 廖国, 杜凯, 唐永建 2012 物理学报 61 6804]

    [9]

    Zheng S B, Hu J F, Guo S J, Hong M Y 1994 Plasma Diagnostics (Vol.1) (Beijing: Electronic Industry Press) p38 (in Chinese) [郑少白, 胡建芳, 郭淑静, 洪明苑 1994 等离子体诊断(上卷) (北京: 电子工业出版社) 第38页]

    [10]

    Ristein J, Stief R T, Ley L, Beyer J 1998 J. Appl. Phys. 84 3836

    [11]

    Zhang Q 2003 Modern Technique And Characterization Methods (Self-complied teaching materials by Sichuan University) p154 (in Chinese) [张倩 2003 近代测试技术及表征 (四川大学自编讲义) 第154页]

    [12]

    Zhao Y X, Sun X Y 2010 The Spectrum Analysis on Structure of Organic Molecules (Beijing: Science Press) p1 (in Chinese) [赵瑶兴, 孙祥玉 2010 有机分子结构光谱解析 (北京: 科学出版社) 第1页]

    [13]

    Benninghoven A 1994 Angew. Chem. Int Ed Engl. 33 1023

    [14]

    Zhao Y X, Sun X Y 2010 The Spectral Identification on Structure of Organic Molecules (2nd Ed.) (Beijing: Science Press) p16 (in Chinese) [赵瑶兴, 孙祥玉 2010 有机分子结构光谱鉴定(第二版) (北京: 科学出版社) 第16页]

    [15]

    VanLeyen D, Hagenhoff B, Niehuis E, Benninghoven A, Bletss I V, Hercules D M 1989 J. Vac. Sci. Technol. A7 1790

    [16]

    Hittle L R, Hercules D M 1994 Surf. Interface Anal. 21 217

    [17]

    Ohring M 1992 The Materials Science of Thin Films (New York: Academic Press) p451

    [18]

    Chapman B N 1980 Glow Discharge Process (New York: John Wiley & Sons) p21

    [19]

    Ryu H J, Kim S H, Hong S H 2000 Materials Science And Engineering 277 57

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  • Received Date:  08 June 2012
  • Accepted Date:  09 October 2012
  • Published Online:  05 March 2013

Influence of working pressure on the state of H2/C4H8 glowing discharge plasma

  • 1. Centre of Laser Fusion Research, China Academy of Engineering Physics, Mianyang 621900, China;
  • 2. Institute of Atomic and Molecular Physics, Sichuan University, Chengdu 610065, China
Fund Project:  Project supported by the National Natural Science Foundation of China (Grant Nos. 10974139, 10964002).

Abstract: The variations of the main positive ion components and their energies for the plasma of H2/C4H8 gas mixture under different working pressures are investigated using the glow discharge technique and plasma mass spectrometry diagnostic method, and the effects of work pressure on both the dissociation mechanism of the mixed gas H2/C4H8 and the forming process of the main positive are analyzed. The results show that both the intensity and energy of the C-H segment ions in H2/C4H8 plasma decrease with pressure increasing. The relative concentration of m/e 41(C3H5+) reaches a maximum when work pressure is 5 Pa. And when the pressure is 10 Pa, the relative concentration of m/e 39(C3H3+) is largest; when the pressures are 15 Pa and 20 Pa, the relative concentration of m/e 29 (C2H5+) is highest; when the pressure is 25 Pa, the relative concentration of m/e 57(C4H9+) is biggest. The component and its energy distribution of H2/C4H8 plasma are qualitatively analyzed. The results will serve as a reference to the optimization of parameters for glow plasma polymer coatings.

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