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中国物理学会期刊
Xu Li-Jun, Zhang He-Ming. Drain-induced barrier-lowering effect in surrounding-gate schottky barrier metal-oxide semiconductor field transistorJ. Acta Physica Sinica, 2013, 62(10): 108502. DOI: 10.7498/aps.62.108502
Citation: Xu Li-Jun, Zhang He-Ming. Drain-induced barrier-lowering effect in surrounding-gate schottky barrier metal-oxide semiconductor field transistorJ. Acta Physica Sinica, 2013, 62(10): 108502. DOI: 10.7498/aps.62.108502

Drain-induced barrier-lowering effect in surrounding-gate schottky barrier metal-oxide semiconductor field transistor

CSTR: 32037.14.aps.62.108502
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