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Si基外延Ru2Si3电子结构及光学性质研究

崔冬萌 谢泉 陈茜 赵凤娟 李旭珍

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Si基外延Ru2Si3电子结构及光学性质研究

崔冬萌, 谢泉, 陈茜, 赵凤娟, 李旭珍

First-principles study on the band structure and optical properties of strained Ru2Si3 semiconductor

Cui Dong-Meng, Xie Quan, Chen Qian, Zhao Feng-Juan, Li Xu-Zhen
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  • 采用基于第一性原理的赝势平面波方法,对异质外延关系为Ru2Si3 (100)//Si(001),取向关系为Ru2Si3[010]//Si[110]正交相的Ru2Si3平衡体系下的能带结构、态密度和光学性质等进行了理论计算.计算结果表明:当晶格常数a取值为1093 nm时,正交相Ru2Si3处于稳定状态并且是具有带隙值
    We calculated the band structure, density of states and optical properties of semiconductor material Ru2Si3 epitaxial-grown on Ru2Si3 (100)//Si(001) with Ru2Si3[010]//Si[110] by using the pseudo-potential plane wave method based on first principles methods. As shown by the calculated results, orthorhombic Ru2Si3 is not only a direct semiconductor with the band gap of 0773 eV, but also in stable condition when the lattice parameter a is 1093 nm.The valence bands of Ru2Si3 are mainly composed of Ru 4d and the conduction bands are mainly composed of Ru 3d and Si 3p. Its static dielectric function ε1(0) is 1891, the refractive index n0 is 4349
    • 基金项目: 国家自然科学基金(批准号:60566001,60766002),科技部国际合作专项项目(批准号:2008DFA52210),贵州省信息产业厅项目(批准号:0831)和贵州大学研究生创新基金(批准号:2009010)资助的课题.
    [1]

    [1]Borisenko V E (Ed.) 2000 Semiconducting Silicides (Springer,Berlin) Miglio L, d’Heurle F (Eds.) 2000 Silicides::Fundamentals and Applications (World Scientific,Singapore)

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    [5]Shaposhnikov V L,Ivanenko L I,Migas D B 2001 Optical Materials 17 339

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    [6]Poutcharovsky D J, Parthe′ E 1974 Acta Crystallogr 30 2692

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    [7]Segall M D, Philip Lindan J D, Probert M J 2002 J. Phys: Condense. Matter 14 2717

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    [8] Broyden C G 1970 Journal of the Institute for Mathematics and Applications 6222

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    [9] Fletcher R 1970 Computer Journal 13 317

    [10]

    ] Goldfarb D 1970 Mathematics of Computation 24 23

    [11]

    ] Shanno D F 1970 Mathematics of Computation 24 647

    [12]

    ] Vanderbilt D 1990 Phys. Rev. B 41 7892

    [13]

    ] Monkhorst H J, Pack J D 1976 Phys. Rev. B 13 5188

    [14]

    ] Henrion W, Rebien M 2000 Thin Solid Films 364 171

  • [1]

    [1]Borisenko V E (Ed.) 2000 Semiconducting Silicides (Springer,Berlin) Miglio L, d’Heurle F (Eds.) 2000 Silicides::Fundamentals and Applications (World Scientific,Singapore)

    [2]

    [2]Lenssen D, Guggi D, Bay H L, Mantl S 2000 Thin Solid Films 368 15

    [3]

    [3] Lenssen D,Lenk S, Bay H L, Mantl S 2000 Thin Solid Films 371 66

    [4]

    [4] Lenssen D,Carius R,Mesters S, Guggi D 2000 Microelectronic Engineering 50 243

    [5]

    [5]Shaposhnikov V L,Ivanenko L I,Migas D B 2001 Optical Materials 17 339

    [6]

    [6]Poutcharovsky D J, Parthe′ E 1974 Acta Crystallogr 30 2692

    [7]

    [7]Segall M D, Philip Lindan J D, Probert M J 2002 J. Phys: Condense. Matter 14 2717

    [8]

    [8] Broyden C G 1970 Journal of the Institute for Mathematics and Applications 6222

    [9]

    [9] Fletcher R 1970 Computer Journal 13 317

    [10]

    ] Goldfarb D 1970 Mathematics of Computation 24 23

    [11]

    ] Shanno D F 1970 Mathematics of Computation 24 647

    [12]

    ] Vanderbilt D 1990 Phys. Rev. B 41 7892

    [13]

    ] Monkhorst H J, Pack J D 1976 Phys. Rev. B 13 5188

    [14]

    ] Henrion W, Rebien M 2000 Thin Solid Films 364 171

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  • 文章访问数:  6720
  • PDF下载量:  1137
  • 被引次数: 0
出版历程
  • 收稿日期:  2009-03-09
  • 修回日期:  2009-06-29
  • 刊出日期:  2010-03-15

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