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斜磁场作用下碰撞电负性等离子体鞘层的玻姆判据

邱明辉 刘惠平 邹秀

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斜磁场作用下碰撞电负性等离子体鞘层的玻姆判据

邱明辉, 刘惠平, 邹秀

Bohm criterion for a collisinal electronegative plasma sheath in an oblique magnetic field

Qiu Ming-Hui, Liu Hui-Ping, Zou Xiu
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  • 采用流体模型研究了外加斜磁场作用下的碰撞电负性等离子体鞘层的玻姆判据, 讨论了负离子和磁场对鞘层玻姆判据的影响. 研究结果表明: 在电负性鞘层中, 正离子更容易进入鞘层, 负离子的存在只能影响离子马赫数取值的下限; 而外加磁场可以使离子马赫数的取值范围整体发生移动.
    The Bohm criterion for a collisinal electronegative plasma sheath in an oblique magnetic field is investigated with a fluid model. The effects of negative ions and magnetic field on the Bohm criterion are discussed. It is shown that the parameters of the negative ions affect only the lower limit for Bohm criterion, and the external magnetic field can affect the whole range of the ion Mach number values.
    • 基金项目: 国家自然科学基金(批准号: 11005015, 10605008)和辽宁省教育厅(批准号: L2011069)资助的课题.
    • Funds: Project supported by the National Natural Science Foundation of China ( Nos. 11005015, 10605008), and the Liaoning Province Education Administration (No. L2011069).
    [1]

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    [2]

    Franklin R N, Snell J 1998 J. Phys. D: Appl. Phys. 31 2532

    [3]

    Franklin R N 1999 J. Phys. D: Appl. Phys. 32 71

    [4]

    Allen J E 2004 Plasma Sources Sci. Technol. 13 48

    [5]

    Femandez Palop J I, Ballesteros J, Colomer V, Hemandez M A, Dengra A 1995 J. Appl. Phys. 77 2937

    [6]

    Femandez Palop J I, Colomer V, Ballesteros J, Hemandez M A, Dengra A 1996 Surface and Coatings Technology 84 341

    [7]

    Valentini H B, Herrmann F 1996 J. Phys. D 29 1175

    [8]

    Lichtenberg A J, Kouznetsov I G, Lee Y T, Lieberman M A, Kaganovich I D, Tsendin L D 1997 Plasma Sources Sci. Technol. 6 437

    [9]

    Franklin R N, Snell J 2000 J. Plasma Phys. 64 131

    [10]

    Annaratone B M, Antonova T, Thomas H M, Morfill G E 2004 Phys. Rev. Lett. 93 185001

    [11]

    Ghim Y C, Kim, Hershkowitz N 2009 Appl. Phys. Lett. 94 51503

    [12]

    Wang Z X, Liu J Y, Zou X, Liu Y, Wang X G 2003 Chinese Physics Letters 20 1537

    [13]

    Gong Y, Duan P, Zhang J H, Zou X, Liu J Y, Liu Y 2010 Chinese J. Computational Physics 27 883

    [14]

    Zhao X Y, Liu J Y, Duan P, Ni Z X 2011 Acta Phys. Sin. 60 045205 (in Chinese)[赵晓云, 刘金远, 段萍, 倪致祥 2011 物理学报 60 045205]

    [15]

    Liu J Y, Wang Z X, Wang X 2003 Phys. Plasmas 10 3032

    [16]

    Ghomi H, Khoramabadi M 2010 J. Plasma Phys. 76 247

    [17]

    Chodura R 1982 Phys. Fluids 25 1628

    [18]

    Riemann K U 1994 Phys. Plasmas 1 552

    [19]

    Stangeby P C 1995 Phys. Plasmas 2 702

    [20]

    Zou X, Ji Y K, Zou B Y 2010 Acta Phys. Sin. 59 1902 (in Chinese) [邹秀, 籍延坤, 邹滨雁 2010 物理学报 59 1902]

  • [1]

    Amemiya H 1990 J. Phys. D: Appl. Phys. 23 999

    [2]

    Franklin R N, Snell J 1998 J. Phys. D: Appl. Phys. 31 2532

    [3]

    Franklin R N 1999 J. Phys. D: Appl. Phys. 32 71

    [4]

    Allen J E 2004 Plasma Sources Sci. Technol. 13 48

    [5]

    Femandez Palop J I, Ballesteros J, Colomer V, Hemandez M A, Dengra A 1995 J. Appl. Phys. 77 2937

    [6]

    Femandez Palop J I, Colomer V, Ballesteros J, Hemandez M A, Dengra A 1996 Surface and Coatings Technology 84 341

    [7]

    Valentini H B, Herrmann F 1996 J. Phys. D 29 1175

    [8]

    Lichtenberg A J, Kouznetsov I G, Lee Y T, Lieberman M A, Kaganovich I D, Tsendin L D 1997 Plasma Sources Sci. Technol. 6 437

    [9]

    Franklin R N, Snell J 2000 J. Plasma Phys. 64 131

    [10]

    Annaratone B M, Antonova T, Thomas H M, Morfill G E 2004 Phys. Rev. Lett. 93 185001

    [11]

    Ghim Y C, Kim, Hershkowitz N 2009 Appl. Phys. Lett. 94 51503

    [12]

    Wang Z X, Liu J Y, Zou X, Liu Y, Wang X G 2003 Chinese Physics Letters 20 1537

    [13]

    Gong Y, Duan P, Zhang J H, Zou X, Liu J Y, Liu Y 2010 Chinese J. Computational Physics 27 883

    [14]

    Zhao X Y, Liu J Y, Duan P, Ni Z X 2011 Acta Phys. Sin. 60 045205 (in Chinese)[赵晓云, 刘金远, 段萍, 倪致祥 2011 物理学报 60 045205]

    [15]

    Liu J Y, Wang Z X, Wang X 2003 Phys. Plasmas 10 3032

    [16]

    Ghomi H, Khoramabadi M 2010 J. Plasma Phys. 76 247

    [17]

    Chodura R 1982 Phys. Fluids 25 1628

    [18]

    Riemann K U 1994 Phys. Plasmas 1 552

    [19]

    Stangeby P C 1995 Phys. Plasmas 2 702

    [20]

    Zou X, Ji Y K, Zou B Y 2010 Acta Phys. Sin. 59 1902 (in Chinese) [邹秀, 籍延坤, 邹滨雁 2010 物理学报 59 1902]

计量
  • 文章访问数:  5635
  • PDF下载量:  418
  • 被引次数: 0
出版历程
  • 收稿日期:  2011-10-07
  • 修回日期:  2011-11-03
  • 刊出日期:  2012-08-05

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