搜索

x

留言板

尊敬的读者、作者、审稿人, 关于本刊的投稿、审稿、编辑和出版的任何问题, 您可以本页添加留言。我们将尽快给您答复。谢谢您的支持!

姓名
邮箱
手机号码
标题
留言内容
验证码

溶胶-凝胶法制备Li-N双掺p型ZnO薄膜的结构、光学和电学性能

王德义 高书霞 李刚 赵鸣

引用本文:
Citation:

溶胶-凝胶法制备Li-N双掺p型ZnO薄膜的结构、光学和电学性能

王德义, 高书霞, 李刚, 赵鸣

The structure,optical and electrical properties of Li-N dual-acceptor doped p-type ZnO thin films prepared by sol-gel method

Wang De-Yi, Gao Shu-Xia, Li Gang, Zhao Ming
PDF
导出引用
  • 采用溶胶-凝胶法在n型Si(100)衬底上沉积Li-N双掺杂ZnO薄膜,经X射线衍射和扫描电镜图片分析,所制备薄膜具有多晶纤锌矿结构和高的c轴择优取向.室温下霍尔效应测试结果显示Li-N双掺杂ZnO薄膜具有p型导电特性.在Li掺杂量为15.0at%,Li/N(摩尔比)为1∶1,700℃退火等优化条件下得到的最佳电学性能结果是:电阻率为0.34 Ω·cm,霍尔迁移率为16.43 cm2/V·s,载流子浓度为2.79×1019 cm-3
    Li-N dual-doped ZnO thin films were deposited on n-type Si(100) substrates with Sol-gel method. Then the deposited films were analyzed by X-ray diffraction (XRD) and scanning electron microscopy (SEM). The results show that the films have polycrystalline wurtzite-structure and high c-axis preferred orientation. The analysis of the results of the deposited thin films tested in the Hall measurement at room temperature shows that these thin films have p-type electrical conductivity. The optimized results obtained at 15.0at% Li-N dual-doped concentration are 0.34 Ω·cm for the electrical resistivity,16.43 cm2/V·s for the Hall mobility and 2.79×1019 cm-3 for the hole concentration,respectively. The photoluminescence (PL) spectra show that the thin films have strong emission of near-ultraviolet (UV) and violet light. However,the defect-related deep level emission is weak in visible regions. The effects of Li-N dual-doping concentration and annealing temperature on the structural,optical and electrical properties are also discussed in this paper.
    • 基金项目: 国家自然科学基金(批准号:50602037)资助的课题.
    [1]

    [1]Guo X L,Choi J H,Tabata H,Kawai T 2001 Jpn. J. Appl. Phys. 40 L177

    [2]

    [2]Sahay P P,Nath R K 2008 Sensors and Actuators B 134 654

    [3]

    [3]Li S T,Yang Y,Zhang L,Cheng P F 2009 Acta Phys. Sin. 58 2543 (in Chinese) [李盛涛、杨雁、张乐、成鹏飞 2009 物理学报 58 2543]

    [4]

    [4]Chung J H,Lee J Y,Kim H S,Jang N W,Kim J H 2008 Thin Solid Films 516 5597

    [5]

    ]Peng X D,Zhu T,Wang F W 2009 Acta Phys. Sin. 58 3274 (in Chinese) [彭先德、朱涛、王芳卫 2009 物理学报 58 3274]

    [6]

    [6]Yang Y F,Long H,Yang G,Zheng Q G,Li Y H,Lu P X 2009 Acta Phys. Sin. 58 2785 (in Chinese) [杨义发、龙华、杨光、郑启光、李玉华、陆培祥 2009 物理学报 58 2785]

    [7]

    [7]Van L H,Hong M H,Ding J 2008 J. Alloys Compd. 449 207

    [8]

    [8]Saw K G,Ibrahim K,Lim Y T,Chai M K 2007 Thin Solid Films. 515 2879

    [9]

    [9]Singh P,Chawla A K,Kaur D,Chandra R 2007 Materials Letters 61 2050

    [10]

    ]Houng B,Hsi C S,Hou B Y,Fu S L 2008 J. Alloys Compd. 456 64

    [11]

    ]Devy F C,Barreau N,Kessler J 2008 Thin Solid Films 516 7094

    [12]

    ]Wang Y Z,Chu B L,He Q Y 2008 Vacuum 82 1229

    [13]

    ]Chen Z Q,Liu M H,Liu Y P,Chen W,Luo Z Q,Hu X W 2009 Acta Phys. Sin. 58 4260 (in Chinese) [陈兆权、刘明海、刘玉萍、陈伟、罗志清、胡希伟 2009 物理学报 58 4260]

    [14]

    ]Chui X Z,Zhang T C,Mei Z X,Liu Z L,Liu Y P,Guo Y,Su X Y,Xue Q K,Du X L 2009 Acta Phys. Sin.58 309 (in Chinese) [崔秀芝、张天冲、梅增霞、刘章龙、刘尧平、郭阳、苏希玉、薛其坤、杜小龙 2009 物理学报 58 309]

    [15]

    ]Jiang Z W,Wang W X,Gao H C,Li H,He T,Yang C L,Chen H,Zhou J M 2009 Acta Phys. Sin. 58 471 (in Chinese) [蒋中伟、王文新、高汉超、李辉、何涛、杨成良、陈弘、周均铭 2009 物理学报 58 471]

    [16]

    ]Xu F,Lu Y,Xie Y,Liu Y F 2009 Vacuum 83 360

    [17]

    ]Chakraborty A,Mondal T,Bera S K,Sen S K,Ghosh R,Paul G K 2008 Materials Chemistry and Physics 112 162

    [18]

    ]Xue S W,Zu X T,Zhou W L,Deng H X,Xiang X,Zhang L,Deng H 2008 J. Alloys Compd. 448 21

    [19]

    ]Tsay C Y,Cheng H C,Tung Y T,Tuan W H,Lin C K 2008 Thin Solid Films. 517 1032

    [20]

    ]Hwangbo S,Lee Y J,Hwang K S 2008 Ceramics International 34 1237

  • [1]

    [1]Guo X L,Choi J H,Tabata H,Kawai T 2001 Jpn. J. Appl. Phys. 40 L177

    [2]

    [2]Sahay P P,Nath R K 2008 Sensors and Actuators B 134 654

    [3]

    [3]Li S T,Yang Y,Zhang L,Cheng P F 2009 Acta Phys. Sin. 58 2543 (in Chinese) [李盛涛、杨雁、张乐、成鹏飞 2009 物理学报 58 2543]

    [4]

    [4]Chung J H,Lee J Y,Kim H S,Jang N W,Kim J H 2008 Thin Solid Films 516 5597

    [5]

    ]Peng X D,Zhu T,Wang F W 2009 Acta Phys. Sin. 58 3274 (in Chinese) [彭先德、朱涛、王芳卫 2009 物理学报 58 3274]

    [6]

    [6]Yang Y F,Long H,Yang G,Zheng Q G,Li Y H,Lu P X 2009 Acta Phys. Sin. 58 2785 (in Chinese) [杨义发、龙华、杨光、郑启光、李玉华、陆培祥 2009 物理学报 58 2785]

    [7]

    [7]Van L H,Hong M H,Ding J 2008 J. Alloys Compd. 449 207

    [8]

    [8]Saw K G,Ibrahim K,Lim Y T,Chai M K 2007 Thin Solid Films. 515 2879

    [9]

    [9]Singh P,Chawla A K,Kaur D,Chandra R 2007 Materials Letters 61 2050

    [10]

    ]Houng B,Hsi C S,Hou B Y,Fu S L 2008 J. Alloys Compd. 456 64

    [11]

    ]Devy F C,Barreau N,Kessler J 2008 Thin Solid Films 516 7094

    [12]

    ]Wang Y Z,Chu B L,He Q Y 2008 Vacuum 82 1229

    [13]

    ]Chen Z Q,Liu M H,Liu Y P,Chen W,Luo Z Q,Hu X W 2009 Acta Phys. Sin. 58 4260 (in Chinese) [陈兆权、刘明海、刘玉萍、陈伟、罗志清、胡希伟 2009 物理学报 58 4260]

    [14]

    ]Chui X Z,Zhang T C,Mei Z X,Liu Z L,Liu Y P,Guo Y,Su X Y,Xue Q K,Du X L 2009 Acta Phys. Sin.58 309 (in Chinese) [崔秀芝、张天冲、梅增霞、刘章龙、刘尧平、郭阳、苏希玉、薛其坤、杜小龙 2009 物理学报 58 309]

    [15]

    ]Jiang Z W,Wang W X,Gao H C,Li H,He T,Yang C L,Chen H,Zhou J M 2009 Acta Phys. Sin. 58 471 (in Chinese) [蒋中伟、王文新、高汉超、李辉、何涛、杨成良、陈弘、周均铭 2009 物理学报 58 471]

    [16]

    ]Xu F,Lu Y,Xie Y,Liu Y F 2009 Vacuum 83 360

    [17]

    ]Chakraborty A,Mondal T,Bera S K,Sen S K,Ghosh R,Paul G K 2008 Materials Chemistry and Physics 112 162

    [18]

    ]Xue S W,Zu X T,Zhou W L,Deng H X,Xiang X,Zhang L,Deng H 2008 J. Alloys Compd. 448 21

    [19]

    ]Tsay C Y,Cheng H C,Tung Y T,Tuan W H,Lin C K 2008 Thin Solid Films. 517 1032

    [20]

    ]Hwangbo S,Lee Y J,Hwang K S 2008 Ceramics International 34 1237

计量
  • 文章访问数:  7811
  • PDF下载量:  907
  • 被引次数: 0
出版历程
  • 收稿日期:  2009-06-12
  • 修回日期:  2009-09-22
  • 刊出日期:  2010-05-15

/

返回文章
返回