基于Sigmoid函数的离轴照明光源全参数解析模型

刘巍; 刘世元; 吴小飞; 张传维

doi:10.7498/aps.60.054213

摘要

本文提出一种全面描述光刻机离轴照明光源物理分布特性的全参数解析模型,该模型采用Sigmoid函数作为构造各种主流离轴光源解析模型的核函数.提出通过加入光源全参数修正项来表征真实光源的各种物理畸变和偏差,全参数修正项可展开为傅里叶级数形式,相应级次的傅里叶系数具有特殊的物理意义,可分别代表偏心、倾斜、椭偏等形式的光源畸变,为光刻分辨率增强技术及其相关领域提供了仿真条件与理论依据,具有重要的应用价值.

关键词:

Abstract

This paper proposes a parametric analytical source model for overall representation of the physical distribution property of off-axis illumination sources in lithographic tools. A Sigmoid function is adopted as a kernel function to construct the analytical model for the multiple mainstream off-axis sources. Corrected parametrical terms are subsequently presented for characterization of different physical distortions and deviations of real illumination sources. The corrected parametrical terms can be decomposed into Fourier series which have the special physical meaning of respectively indicating different distortion types including shift of the center, tilt, ellipticity, etc. The proposed analytical model provides both simulation condition and theoretical basis for the resolution enhancement technique and the related research fields, thus has important applications.

Keywords:

作者及机构信息

(1)华中科技大学武汉光电国家实验室,武汉 430074; (2)华中科技大学武汉光电国家实验室,武汉 430074;华中科技大学数字制造装备与技术国家重点实验室,武汉 430074

基金项目: 国家自然科学基金(批准号:91023032, 51005091, 50775090),中国博士后科学基金(批准号:20100470052),中央高校基本科研业务费专项资金(批准号:2010ZD004)资助的课题.

Authors and contacts

(1)Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, China; (2)Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, China; State Key Laboratory of Digital Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan 430074, China

参考文献

[1]	Schellenberg F M 2005 Opt. Rev. 12 83
[2]	Cao P F, Cheng L, Zhang X P 2008 Acta. Phys. Sin. 57 6946 (in Chinese) [曹鹏飞、程琳、张晓萍 2008 物理学报 57 6946]
[3]	Li H H, Chen J, Wang Q K 2010 Chin. Phys. B 19 114203
[4]	Perin G, Sezginer A, Zach F X 2006 J. Microlith. Microfab. Microsyst. 5 023006
[5]	Zhang S L, Zheng Q 1985 Acta. Phys. Sin. 34 439 (in Chinese) [庄松林、郑权 1985 物理学报 34 439]
[6]	Zhang S L, Chen X Z 1979 Acta. Phys. Sin. 28 657 (in Chinese) [庄松林、陈祥祯 1979 物理学报 28 657]
[7]	Liu W, Liu S Y, Zhou T T, Wang L J 2009 Opt. Express 17 19278
[8]	Liu W, Liu S Y, Shi T L, Tang Z R 2010 Opt. Express 18 20096
[9]	Yamazoe K 2010 Appl. Opt. 49 3909
[10]	Ma X, Arce G R 2008 Opt. Express 16 20126
[11]	Bodendorf C, Schlief R E, Ziebold R 2004 Proc. SPIE 5377 1130
[12]	Barrett T C 2000 Proc. SPIE 4000 804
[13]	Phillips M C, Slonaker S D, Treadway C, Darby Greg 2005 Proc. SPIE 5754 1562
[14]	Guo L P, Wang X Z, Hang H J 2006 Chin. Opt. Lett. 4 237
[15]	Granik Y 2004 Proc. SPIE 5524 217
[16]	Renwick S P, Nishinaga H, Kita N 2006 Proc. SPIE 6154 61540O
[17]	Flagello D G, Geh B, Socha R, Liu P, Cao Y, Stas R, Natt O, Zimmermann J 2008 Proc. SPIE 6924 69241U
[18]	Laan H van der, Dierichs M, Greevenbroek H van, McCoo E, Stoffels F, Pongers R, Willekers R 2001 Proc. SPIE 4346 394

施引文献

[1]	Schellenberg F M 2005 Opt. Rev. 12 83
[2]	Cao P F, Cheng L, Zhang X P 2008 Acta. Phys. Sin. 57 6946 (in Chinese) [曹鹏飞、程琳、张晓萍 2008 物理学报 57 6946]
[3]	Li H H, Chen J, Wang Q K 2010 Chin. Phys. B 19 114203
[4]	Perin G, Sezginer A, Zach F X 2006 J. Microlith. Microfab. Microsyst. 5 023006
[5]	Zhang S L, Zheng Q 1985 Acta. Phys. Sin. 34 439 (in Chinese) [庄松林、郑权 1985 物理学报 34 439]
[6]	Zhang S L, Chen X Z 1979 Acta. Phys. Sin. 28 657 (in Chinese) [庄松林、陈祥祯 1979 物理学报 28 657]
[7]	Liu W, Liu S Y, Zhou T T, Wang L J 2009 Opt. Express 17 19278
[8]	Liu W, Liu S Y, Shi T L, Tang Z R 2010 Opt. Express 18 20096
[9]	Yamazoe K 2010 Appl. Opt. 49 3909
[10]	Ma X, Arce G R 2008 Opt. Express 16 20126
[11]	Bodendorf C, Schlief R E, Ziebold R 2004 Proc. SPIE 5377 1130
[12]	Barrett T C 2000 Proc. SPIE 4000 804
[13]	Phillips M C, Slonaker S D, Treadway C, Darby Greg 2005 Proc. SPIE 5754 1562
[14]	Guo L P, Wang X Z, Hang H J 2006 Chin. Opt. Lett. 4 237
[15]	Granik Y 2004 Proc. SPIE 5524 217
[16]	Renwick S P, Nishinaga H, Kita N 2006 Proc. SPIE 6154 61540O
[17]	Flagello D G, Geh B, Socha R, Liu P, Cao Y, Stas R, Natt O, Zimmermann J 2008 Proc. SPIE 6924 69241U
[18]	Laan H van der, Dierichs M, Greevenbroek H van, McCoo E, Stoffels F, Pongers R, Willekers R 2001 Proc. SPIE 4346 394

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