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两种带电尘埃颗粒的等离子体鞘层玻姆判据

赵晓云 张丙开 张开银

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两种带电尘埃颗粒的等离子体鞘层玻姆判据

赵晓云, 张丙开, 张开银

The Bohm criterion for a plasma sheath with two species of charged dust particles

Zhao Xiao-Yun, Zhang Bing-Kai, Zhang Kai-Yin
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  • 采用流体方程和尘埃充电自洽模型研究了鞘边含有两种尘埃颗粒的等离子体玻姆判据. 通过拟牛顿法数值模拟了鞘边两种尘埃颗粒的存在对尘埃自身充电以及离子马赫数的影响. 两种尘埃颗粒中含量较少的尘埃颗粒数密度的增加, 导致两种尘埃颗粒表面悬浮势一个降低, 一个升高. 含量较少的尘埃颗粒的数密度越多和半径越小, 都会导致离子马赫数增大. 另外鞘边无论何种尘埃颗粒的速度增加, 鞘边离子马赫数都将减小.
    The fluid model and the self-consistent dust charging model are used to investigate the Bohm criterion for the plasma sheath including two species of charged dust particles. Numerical calculation results are obtained using quasi-Newton method. Effects of two species of dust particles on the dust charging and the ion Mach number are discussed. As the number density of the fewer dust particles is enhanced, different changes will take place on the surface potential of the two species of dust particles. Either more number density or smaller radius of the fewer dust particle may result in a larger ion Mach number. In addition, the ion Mach number will reduce when the velocity of any kind of dust particles at the sheath edge increases.
    • 基金项目: 国家自然科学基金(批准号: 11273008, 51271059)资助的课题.
    • Funds: Project supported by the National Natural Science Foundation of China (Grant Nos. 11273008, 51271059).
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    [2]

    Selwyn G S, Singh J, Bennett R S 1989 J. Vac. Sci. Technol. A 7 2758

    [3]

    Howling A A, Hollenstein C, Paris P J 1991 Appl. Phys. Lett. 59 1409

    [4]

    Boufendi L, Plain A, Blondeau J P, Bouchoule A, Laure C, Toogood M 1992 Appl. Phys. Lett. 60 169

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    Barkan A, Angelo N D, Merlino R L 1994 Phys. Rev. Lett. 73 3093

    [7]

    Ma J X, Liu J Y, Yu M Y 1997 Phys. Rev. E 55 4627

    [8]

    Liu J Y, Wang Z X, Wang X G, Zhang Q, Zou X 2003 Phys. plasmas 10 3507

    [9]

    Wang Z X, Liu J Y, Zou X, Liu Y, Wang X G 2004 Acta Phys. Sin. 53 793 (in Chinese) [王正汹, 刘金远, 邹秀, 刘悦, 王晓钢 2004 物理学报 53 793]

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    Pandey B P, Dutta A 2005 Indian Academy of Sciences 65 117

    [11]

    Wang Z X, Liu Y, Ren L W, Liu J Y, Wang X G 2006 Thin Solid Films 506-507 637

    [12]

    Chekour S, Tahraoui A, Zaham B 2012 Phys. Plasmas 19 053502

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    Vishnyakov V I 2012 Phys. Rev. E 85 026402

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    Duan P, Liu J Y, Gong Y, ZhangY, Liu Y, Wang X G 2007 Acta Phys. Sin. 56 7090 (in Chinese) [段萍, 刘金远, 宫野, 张宇, 刘悦, 王晓钢 2007 物理学报 56 7090]

    [15]

    Liu J Y, Chen L, Wang F, Wang N, Duan P 2010 Acta Phys. Sin. 59 8692 (in Chinese) [刘金远, 陈龙, 王丰, 王楠, 段萍 2010 物理学报 59 8692]

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    Mehdipour H, Denysenko I, Ostrikov K 2010 Phys. plasmas 17 123708

    [17]

    Pandey B P, Vladimirov S V, Samarian A 2011 Phys. plasmas 18 053703

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    Wu J, Liu G, Yao L M, Duan X R 2012 Acta Phys. Sin. 61 075205 (in Chinese) [吴静, 刘国, 姚列明, 段旭如 2012 物理学报 61 075205]

    [19]

    Foroutan G, Akhoundi A 2012 Phys. Lett. A 376 2244

    [20]

    Li F 2002 Chinese Phys. Lett. 19 214

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    Hou L J, Wang Y N 2003 Acta Phys. Sin. 52 434 (in Chinese) [侯璐景, 王友年 2003 物理学报 52 434]

    [22]

    Wu J, Zhang P Y, Sun J Z, Zhang J, Ding Z F, Wang D Z 2008 Chin. Phys. B 17 1848

    [23]

    Liu X M, Song Y H, Wang Y N 2009 Chinese Phys. Lett. 26 085201

    [24]

    Zhang L P, Xue J K, Li Y L 2011 Chin. Phys. B 20 115201

    [25]

    Wu J, Zhang P Y, Sun J Z, Yao L M, Duan X R 2011 Chinese Phys. Lett. 28 095201

    [26]

    Hou L J, Wang Y N, Miskovic Z L 2001 Phys. Lett. A 292 129

    [27]

    Vladimirov S V, Maiorov S A, Cramer N F 2003 Phys. Rev. E 67 016407

    [28]

    Vladimirov S V, Maiorov S A, Ishihara O 2003 Phys. Plasmas 10 3867

    [29]

    Tsytovich V N, Morfill G, Konopka U, Thomas H 2003 New J. Phys. 5 66

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    Liu Y, Song Y, Wang Z X, Wang X G 2007 Phys. Plasmas 14 094501

    [31]

    Foroutan G, Akhoundi A 2012 J. Appl. Phys. 112 073301

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    Chen F F 1974 Introduction to Plasma Physics (New York: Plenum) p156

  • [1]

    Roth R M, Spears K G, Stein G D, Wong G 1985 Appl. Phys. Lett. 46 253

    [2]

    Selwyn G S, Singh J, Bennett R S 1989 J. Vac. Sci. Technol. A 7 2758

    [3]

    Howling A A, Hollenstein C, Paris P J 1991 Appl. Phys. Lett. 59 1409

    [4]

    Boufendi L, Plain A, Blondeau J P, Bouchoule A, Laure C, Toogood M 1992 Appl. Phys. Lett. 60 169

    [5]

    Carlile R N, Geha S S 1993 J. Appl. Phys. 73 4785

    [6]

    Barkan A, Angelo N D, Merlino R L 1994 Phys. Rev. Lett. 73 3093

    [7]

    Ma J X, Liu J Y, Yu M Y 1997 Phys. Rev. E 55 4627

    [8]

    Liu J Y, Wang Z X, Wang X G, Zhang Q, Zou X 2003 Phys. plasmas 10 3507

    [9]

    Wang Z X, Liu J Y, Zou X, Liu Y, Wang X G 2004 Acta Phys. Sin. 53 793 (in Chinese) [王正汹, 刘金远, 邹秀, 刘悦, 王晓钢 2004 物理学报 53 793]

    [10]

    Pandey B P, Dutta A 2005 Indian Academy of Sciences 65 117

    [11]

    Wang Z X, Liu Y, Ren L W, Liu J Y, Wang X G 2006 Thin Solid Films 506-507 637

    [12]

    Chekour S, Tahraoui A, Zaham B 2012 Phys. Plasmas 19 053502

    [13]

    Vishnyakov V I 2012 Phys. Rev. E 85 026402

    [14]

    Duan P, Liu J Y, Gong Y, ZhangY, Liu Y, Wang X G 2007 Acta Phys. Sin. 56 7090 (in Chinese) [段萍, 刘金远, 宫野, 张宇, 刘悦, 王晓钢 2007 物理学报 56 7090]

    [15]

    Liu J Y, Chen L, Wang F, Wang N, Duan P 2010 Acta Phys. Sin. 59 8692 (in Chinese) [刘金远, 陈龙, 王丰, 王楠, 段萍 2010 物理学报 59 8692]

    [16]

    Mehdipour H, Denysenko I, Ostrikov K 2010 Phys. plasmas 17 123708

    [17]

    Pandey B P, Vladimirov S V, Samarian A 2011 Phys. plasmas 18 053703

    [18]

    Wu J, Liu G, Yao L M, Duan X R 2012 Acta Phys. Sin. 61 075205 (in Chinese) [吴静, 刘国, 姚列明, 段旭如 2012 物理学报 61 075205]

    [19]

    Foroutan G, Akhoundi A 2012 Phys. Lett. A 376 2244

    [20]

    Li F 2002 Chinese Phys. Lett. 19 214

    [21]

    Hou L J, Wang Y N 2003 Acta Phys. Sin. 52 434 (in Chinese) [侯璐景, 王友年 2003 物理学报 52 434]

    [22]

    Wu J, Zhang P Y, Sun J Z, Zhang J, Ding Z F, Wang D Z 2008 Chin. Phys. B 17 1848

    [23]

    Liu X M, Song Y H, Wang Y N 2009 Chinese Phys. Lett. 26 085201

    [24]

    Zhang L P, Xue J K, Li Y L 2011 Chin. Phys. B 20 115201

    [25]

    Wu J, Zhang P Y, Sun J Z, Yao L M, Duan X R 2011 Chinese Phys. Lett. 28 095201

    [26]

    Hou L J, Wang Y N, Miskovic Z L 2001 Phys. Lett. A 292 129

    [27]

    Vladimirov S V, Maiorov S A, Cramer N F 2003 Phys. Rev. E 67 016407

    [28]

    Vladimirov S V, Maiorov S A, Ishihara O 2003 Phys. Plasmas 10 3867

    [29]

    Tsytovich V N, Morfill G, Konopka U, Thomas H 2003 New J. Phys. 5 66

    [30]

    Liu Y, Song Y, Wang Z X, Wang X G 2007 Phys. Plasmas 14 094501

    [31]

    Foroutan G, Akhoundi A 2012 J. Appl. Phys. 112 073301

    [32]

    Chen F F 1974 Introduction to Plasma Physics (New York: Plenum) p156

计量
  • 文章访问数:  5031
  • PDF下载量:  223
  • 被引次数: 0
出版历程
  • 收稿日期:  2013-03-28
  • 修回日期:  2013-04-23
  • 刊出日期:  2013-09-05

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