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本文对管式装置中等离子体化学气相沉积过程提出了一种数学描述方式,具体讨论了沉积过程中活性粒子产生频率、沉积速率和沉积效率等与电子密度、气体流速、气体压强等的相互关系,并对部分结果进行了理论解释。A kinetic model for the glow discharge plasma deposition process in the axial-flow reactor is proposed. In particular, the realtionships between the deposition characteristics (i.e., generation rate, generation frequency, deposition rate, and gas efficiency) and the process parameters (gas flow rate and gas pressure) are examined by numerical modeling technique. Some results has been explained.
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