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报道了微波放电法在GaAs表面与Al金属片上生长GaS薄膜.用俄歇电子能谱(AES)和卢瑟福背散射能谱(RBS)分析了薄膜的成分,X射线衍射测试了薄膜的结构.结果表明,微波放电法生长的GaS薄膜是属于六方晶系的多晶材料.此外,用椭圆偏振光谱测定了GaS薄膜的折射率以及由金属/绝缘体/金属(MIM)结构的电容值得到GaS薄膜的介电常数A novel passivation film on GaAs surface has been grown by microwave sulfur glow discharge technique.Auger electron spectroscopy and Rutherford back scattering measurements show that the film is mainly composed of sulfur and gallium,and atomic ratio of gallium to sulfur is about 1∶1.From X-ray diffraction spectroscopy measurememt,GaS is identified to be hexagonal polycrystalline material.The refraction index and dielectric constant of GaS have also been determined.
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