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利用Monte Carlo(MC)模型研究了能量粒子对薄膜生长的初始阶段岛膜的形貌和岛的尺寸的影响,沉积粒子的能量范围为:0—0.7eV.在模型中考虑了原子沉积、吸附原子扩散和蒸发等过程,并详细考虑了临近和次临近原子的影响.结果表明,在所采用的参量范围内不同的基底温度情况下,能量粒子的影响有很大的区别.低基底温度情况下,沉积粒子强烈地影响着薄膜的生长过程中,岛膜的形貌、数量和尺寸随能量粒子的能量增加而有很大的变化.分析表明,这些变化都是由于能量粒子的介入使得表面吸附粒子的扩散能力增强所致
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关键词:
- 薄膜生长 /
- Monte Carlo方法 /
- 扩散
The effect of low-energy deposition particles on the initial stage of thin film growth is studied by Monte Carlo simulation in this paper. The energy range of deposition particles is from 0 to 0.7eV. Three processes are considered: atom deposition, adatom diffusion and re evaporation. The effect of nearest adatoms and next near adatoms is also considered. The results show that the low-energy ion irradiation strongly affects the island film growth process at low temperature. Morphologies and size distributions of islands have significantly changed with the increase of incident ion energy.-
Keywords:
- thin film growth /
- Monte Carlo method /
- diffusion
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