基于混合注入机制的级联尾场电子加速

谭放; 张晓辉; 朱斌; 李纲; 吴玉迟; 于明海; 杨月; 闫永宏; 杨靖; 范伟; 董克攻; 卢峰; 谷渝秋

doi:10.7498/aps.68.20190484

摘要

激光尾场电子加速装置中, 为了获得可稳定重复产生的高质量单能尾场电子, 电子的可控注入是其中的关键. 基于自主设计的级联加速喷气靶, 研究离化注入、冲击波前沿注入等可控注入技术及其结合对尾场电子产生阈值、电子能谱及其稳定性的影响. 研究结果显示, 离化注入机制、冲击波前沿注入机制以及级联加速喷嘴的结合, 可以使尾场电子的注入阈值大幅度降低, 且电子的离化注入区域被限制于冲击波前沿处, 最终大幅度降低电子束的绝对能散、提高稳定性. 在最优化的条件下, 可以获得最小发散角为(3.6 × 3.8) mrad, 平均中心能量为(63.24 ± 6.12) MeV, 平均能散为(13.0 ± 3.9) MeV、平均电量为(5.99 ± 3.10) pC的重频单能尾场电子.

关键词:

Abstract

Femtosecond electron bunches can be produced by laser plasma wakefield accelerators, with energy tunable from tens of MeV to a few GeV. In order to produce stable mono-energetic electron bunches, a critical issue is to control the injection of electron into the wakefield. The ionization injection is one of the most effective methods of controlling the injection, which is usually a continuous process. So, the electron bunches produced through ionization injection usually possess large energy spread. In order to optimize the ionization injection technique and produce stable monoenergetic wakefield electron beams, experimental studies are conducted on our 45 TW laser facility. In this work, a mixed injection mechanism assisted cascaded laser wakefield accelerator is presented. Based on a double-nozzle cascaded accelerator, the influences of ionization injection, shock wave front injection and their combination are experimentally studied. The results show that the lower threshold of the injection can be substantially reduced. The ionization injection is restricted within the shock wave front. As a result, mono-energetic electron bunches with reduced absolute energy spread can be stably produced. Under the most optimal conditions, the central energy and energy spread are (63.24 ± 6.12) MeV and (13.0 ± 3.9) MeV. The charge quantity of the electron bunches is (5.99 ± 3.10) pC. The minimum emitting anglular spread is (3.6 × 3.8) mrad.

Keywords:

作者及机构信息

1.
中国科学技术大学近代物理系, 合肥　030006

2.
中国工程物理研究院激光聚变研究中心, 高温高密度等离子体物理国家重点实验室, 绵阳　621900

通信作者: 谷渝秋, yqgu@caep.cn

基金项目: 中国工程物理研究院院长基金(批准号: 2014-01-17)、国家自然科学基金委员会-中国工程物理研究院联合基金(批准号: U1630246)、国防基础科研核基础科学挑战专题高能量密度科学领域(批准号: JCKY2016212A505)和国家重点研发计划(批准号: 016YFA0401100)资助的课题.

Authors and contacts

1.
Institute of Modern Physics, University of Science and Technology of China, Hefei 030006, China

2.
Science and Technology on Plasma Physics Laboratory, Laser Fusion Research Center, China Academy of Engineering Physics, Mianyang 621900, China

Corresponding author: Gu Yu-Qiu, yqgu@caep.cn

Funds: Project supported the Presidential Foundation of the China Academy of Engineering Physics (Grant No. 2014-1-017), the Joint Fund of the National Natural Science Foundation of China and the China Academy of Engineering Physics (Grant No. U1630246), the Science Challenge Project, China (Grant No. JCKY2016212A505), and the National Key Research and Development Program of China (Grant No. 016YFA0401100).

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参考文献

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施引文献

图 1 　(a) 喷嘴设计及实验排布; (b) 气体密度分布侧视二维图; (c) 2 mm高处气体密度对应电子密度的一维分布

Fig. 1. 　(a) The gas jet designment and the experimental layout; (b) the side view of the gas density distribution; (c) the one dimensional electron density at a height of 2 mm from the gas jet.

下载: 全尺寸图片幻灯片

图 2 电子束斑 (上)单喷嘴、纯He气结果; (下)双喷嘴无刀边、混合气结果

Fig. 2. Electron angular distribution for ((a)−(e)) single stage gas jet and ((f)−(j)) dual-stage gas jet.

下载: 全尺寸图片幻灯片

图 3 电子束斑　(a)−(e) He气结果; (f)−(j) He气混入2.5% N₂气结果

Fig. 3. The electron angular distribution for (a)−(e) pure He and (f)−(j) the mixed gas of He with 2.5% N₂.

下载: 全尺寸图片幻灯片

图 4 喷气气压650 kPa时发射角最小的电子束斑

Fig. 4. The spot size for shot 0562 when the jet pressure is 650 kPa.

下载: 全尺寸图片幻灯片

图 5 喷气气压650 kPa时连续打靶5发, 磁谱仪测量到的电子能谱

Fig. 5. Electron energy spectra for continuous 5 shots under jet pressure of 650 kPa.

下载: 全尺寸图片幻灯片

图 6 等离子体中电子在纵向相空间(x-γV_x)的分布

Fig. 6. The Distribution of electrons in longitudinal phase space (x-γV_x).

下载: 全尺寸图片幻灯片

表 1 喷气气压650 kPa时连续打靶6发得到的电子束斑参数, θ_x_,, θ_y为出射方向, σ_x, σ_y为角分布光斑的半高全宽直径

Table 1. The emitting direction θ_x, θ_y and the FWHM angular spread σ_x, σ_y of the electron angular distribution for continuous 6 shots under jet pressure of 650 kPa.

发次号 θ_x/mrad θy/mrad σ_x/mrad σ_y/mrad

558 –25.5 28.9 8.5 5.6
559 –22.1 27.3 5.0 5.6
560 –23.5 23.3 6.2 4.8
561 –19.0 23.3 6.5 5.1
562 –18.1 24.2 3.8 3.6
563 –19.7 19.4 6.4 4.4

下载: 导出CSV

表 2 喷气气压650 kPa时连续打靶5发得到的电子能谱参数

Table 2. The central energy, charge and energy spread of the electrons for continuous 5 shots when the jet pressure is 650 kPa.

发次号中心能量/MeV 电量/pC 能散FWHM/MeV

570 66.7 6.5 10
571 66.1 9.4 17
572 58.2 2.0 6.9
573 54.2 9.2 14.3
574 71 2.86 16.6

下载: 导出CSV

[1]	Tajima T, Dawson J M 1979 Phys. Rev. Lett. 43 267 Google Scholar
[2]	徐慧, 盛政明, 张杰 2007 物理学报 56 968 Google Scholar Xu H, Sheng Z M, Zhang J 2007 Acta Phys. Sin. 56 968 Google Scholar
[3]	Esarey E, Schroeder C B, Leemans W P 2009 Rev. Mod. Phys. 81 1229 Google Scholar
[4]	Mangles S P D, Murphy C D, Najmudin Z, Thomas A G R, Collier J L, Dangor A B, Divall E J, Foster P S, Gallacher J G, Hooker C J, Jaroszyanski D A, Langley A J, Mori W B, Norreys P A, Tsung F S, Viskup R, Walton B R, Krushelnick K 2004 Nature 431 535 Google Scholar
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[10]	Leemans W P, Gonsalves A J, Mao H S, Nakamura K, Benedetti C, Schroeder C B, Tóth C, Daniels J, Mittelberger D E, Bulanov S S, Vay J L, Geddes C G R, Esarey E 2014 Phys. Rev. Lett. 113 245002 Google Scholar
[11]	Catravas P, Esarey E, Leemans W P 2001 Meas. Sci. Technology 12 1828 Google Scholar
[12]	Powers N D, Ghebregziabher I, Golovin G, Liu C, Chen S, Banerjee S, Zhang J, Umstadter D P 2013 Nat. Photonics 8 28
[13]	Chen S, Powers N D, Ghebregziabher I, Maharjan C M, Liu C, Golovin G, Banerjee S, Zhang J, Cunningham N, Moorti A, Clarke S, Pozzi S, Umstadter D P 2013 Phys. Rev. Lett. 110 155003 Google Scholar
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[15]	Yan W, Fruhling C, Golovin G, Haden D, Luo J, Zhang P, Zhao B, Zhang J, Liu C, Chen M, Chen S, Banerjee S, Umstadter D 2017 Nat. Photonics 11 514 Google Scholar
[16]	Khrennikov K, Wenz J, Buck A, Xu J, Heigoldt M, Veisz L, Karsch S 2015 Phys. Rev. Lett. 114 195003 Google Scholar
[17]	Phuoc K T, Corde S, Thaury C, Malka V, Tafzi A, Goddet J P, Shah R C, Sebban S, Rousse A 2012 Nat. Photonics 6 308 Google Scholar
[18]	Tsai H E, Wang X M, Shaw J M, Li Z Y, Arefiev A V, Zhang X, Zgadzaj R, Henderson W, Khudik V, Shvets G, Downer M C 2015 Phys. Plasmas 22 023106 Google Scholar
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[20]	Modena A, Najmudin Z, Dangor A E, Clayton C E, Marsh C A, Joshi C, Malka V, Darrow C B, Danson C, Neely D, Walsh F N 1995 Nature 377 606 Google Scholar
[21]	Tzeng K C, Mori W B, Katsouleas T 1997 Phys. Rev. Lett. 79 5258 Google Scholar
[22]	Bulanov S V, Pegoraro F, Pukhov A M, Sakharov A S 1997 Phys. Rev. Lett. 78 4205 Google Scholar
[23]	Gordon D, Tzeng K C, Clayton C E, Dangor A E, Malka V, Marsh K A, Modena A, Mori W B, Muggli P, Najmudin Z, Neely D, Danson C, Joshi C 1998 Phys. Rev. Lett. 80 2133 Google Scholar
[24]	Kostyukov I, Pukhov A, Kiselev S 2004 Phys. Plasmas 11 5256 Google Scholar
[25]	Lu W, Huang C, Zhou M, Mori W B, Katsouleas T 2006 Phys. Rev. Lett. 96 165002 Google Scholar
[26]	Osterhoff J, Popp A, Major Z, Marx B, Rowlands-Rees T P, Fuchs M, Geissler M, Hörlein R, Hidding B, Becker S, Peralta E A, Schramm U, Grüner F, Habs D, Krausz F, Hooker S M, Karsch S 2008 Phys. Rev. Lett. 101 085002 Google Scholar
[27]	Chen M, Esarey E, Schroeder C B, Geddes C G R, Leemans W P 2012 Phys. Plasmas 19 033101 Google Scholar
[28]	Rowlands-Rees T P, Kamperidis C, Kneip S, Gonsalves A J, Mangles S P D, Gallacher J G, Brunetti E, Ibbotson T, Murphy C D, Foster P S, Streeter M J V, Budde F, Norreys P A, Jaroszynski D A, Krushelnick K, Najmudin Z, Hooker S M 2008 Phys. Rev. Lett. 100 105005 Google Scholar
[29]	Pak A, Marsh K A, Martins S F, Lu W, Mori W B, Joshi C 2010 Phys. Rev. Lett. 104 025003 Google Scholar
[30]	McGuffey C, Thomas A G R, Schumaker W, Matsuoka T, Chvykov V, Dollar F J, Kalintchenko G, Yanovsky V, Maksimchuk A, Krushelnick K 2010 Phys. Rev. Lett. 104 025004 Google Scholar
[31]	Esarey E, Hubbard R F, Leemans W P, Ting A, Sprangle P 1997 Phys. Rev. Lett. 79 2682 Google Scholar
[32]	Faure J, Rechatin C, Norlin A, Lifschitz A, Glinec Y, Malka V 2006 Nature 444 737 Google Scholar
[33]	Kotaki H, Daito I, Kando M, Hayashi Y, Kawase K, Kameshima T, Fukuda Y, Homma T, Ma J, Chen L M, Esirkepov T Zh, Pirozhkov A S, Koga J K, Faenov A, Pikuz T, Kiriyama H, Okada H, Shimomura T, Nakai Y, Tanoue M, Sasao H, Wakai D, Matsuura H, Kondo S, Kanazawa S, Sugiyama A, Daido H, Bulanov S V 2009 Phys. Rev. Lett. 103 194803 Google Scholar
[34]	Bulanov S, Naumova N, Pegoraro F, Sakai J 1998 Phys. Rev. E 58 R5257 Google Scholar
[35]	Geddes C G R, Nakamura K, Plateau G R, Toth C, Cormier-Michel E, Esarey E, Schroeder C B, Cary J R, Leemans W P 2008 Phys. Rev. Lett. 110 215004
[36]	Faure J, Rechatin C, Lundh O, Ammoura L, Malka V 2010 Phys. Plasmas 17 083107 Google Scholar
[37]	Gonsalves A J, Nakamura K, Lin C, Panasenko D, Shiraishi S, Sokollik T, Benedetti C, Schroeder C B, Geddes C G R, van Tilborg J, Osterhoff J, Esarey E, Toth C, Leemans W P 2011 Nat. Phys. 7 862 Google Scholar
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