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THE SERIES RESISTANCE AND CUTOFF FREQUENCY OF DOUBLE DIFFUSED PARAMETRIC DIODE

SHIUH GEN-TWEN CHUO CHI-TSANG

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THE SERIES RESISTANCE AND CUTOFF FREQUENCY OF DOUBLE DIFFUSED PARAMETRIC DIODE

SHIUH GEN-TWEN, CHUO CHI-TSANG
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  • The present analysis is an extension of previous work by the authors, in which the ordinary single diffused structure is only a limiting case where a→∞. Example of the analysis applied to silicon with phosphorus and boron as diffusants has been given. It is indicated that the double diffusion technique is the most effective one for increasing the cutoff frequency of parametric diode.
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  • Abstract views:  6791
  • PDF Downloads:  390
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Publishing process
  • Received Date:  01 April 1963
  • Published Online:  05 March 1964

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