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RHEED INTENSITY OSCILLATIONS IN THE PROCESS OF MOLECULAR BEAM EPITAXY GROWTH OF Ge AND Si ON Si SUBSTRATES

CHEN KE-MING JIN GAO-LONG SHENG CHI ZHOU GAO-LIANG JIANO WEI-DONG ZHANG XIANG-JIU YU MING-REN

Citation:

RHEED INTENSITY OSCILLATIONS IN THE PROCESS OF MOLECULAR BEAM EPITAXY GROWTH OF Ge AND Si ON Si SUBSTRATES

CHEN KE-MING, JIN GAO-LONG, SHENG CHI, ZHOU GAO-LIANG, JIANO WEI-DONG, ZHANG XIANG-JIU, YU MING-REN
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Publishing process
  • Received Date:  12 April 1989
  • Published Online:  05 January 1990

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