A KINETIC ANALYSIS OF THE DEPOSITION MASS DISTRI-BUTION IN AN AXIAL-FLOW RF PCVD REACTOR

留言板

尊敬的读者、作者、审稿人, 关于本刊的投稿、审稿、编辑和出版的任何问题, 您可以本页添加留言。我们将尽快给您答复。谢谢您的支持!

姓名

邮箱

手机号码

标题

留言内容

验证码

Abstract
On the basis of the diagnostics about the axial distribution of plasma electron temperature and electron density in an axial flow RF PCVD reactor by using electrical probe, a model for two-dimension fluid kinetics concerned with major PCVD parameters is proposed. A kinetic analysis about how deposition profiles are influenced by major PCVD parameters is presented by means of the analysis of plasma parameters. The model has been applied to study the deposition process of SnO2 films obtained from a gases mixture of SnCl4 and O2. The theoretical calculation are in good agreement with the experiments of deposition.
Authors and contacts
LIU DA-MING²,

LIU ZU-LI³,

YAO KAI-LUN⁴,

LI ZAI-GUANG¹

(1)华中理工大学激光国家重点实验室,武汉,430074; (2)华中理工大学物理系,华中理工大学激光国家重点实验室,武汉,430074; (3)华中理工大学物理系,武汉,430074; (4)华中理工大学物理系,武汉,430074;中国高等科学技术中心(世界实验室),北京,100080
References

Cited By

留言板