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EFFECT OF ADDITION OF BORON ON SPUTTERING YIELD OF NICKEL

WANG ZHEN-XIA ZHANG JI-PING PAN JI-SHENG TAO ZHEN-LAN ZHANG HUI-MING ZHANG WEI-PING LU ZHAO-LUN

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EFFECT OF ADDITION OF BORON ON SPUTTERING YIELD OF NICKEL

WANG ZHEN-XIA, ZHANG JI-PING, PAN JI-SHENG, TAO ZHEN-LAN, ZHANG HUI-MING, ZHANG WEI-PING, LU ZHAO-LUN
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  • The effect of dopant boron in bulk nickel on sputtering yield has been investigated by the Rutherford backscattering spectroscopy technique. It was shown that a decrease in sputter-ing yield with respect to pure nickel target can be described qualitatively by Painter and Ave-rill's model, but the decrease in our experiment appeared larger than that estimated by P-A model. The obvious effect of textured surface upon the reduction of sputtering of B-doped Ni target has been shown. It is conjectured that this reduction of net sputtering yield is very probably the result of a surface topography-binding energy combined effect.
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  • Received Date:  26 November 1990
  • Published Online:  05 May 1991

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