The effect of dopant boron in bulk nickel on sputtering yield has been investigated by the Rutherford backscattering spectroscopy technique. It was shown that a decrease in sputter-ing yield with respect to pure nickel target can be described qualitatively by Painter and Ave-rill's model, but the decrease in our experiment appeared larger than that estimated by P-A model. The obvious effect of textured surface upon the reduction of sputtering of B-doped Ni target has been shown. It is conjectured that this reduction of net sputtering yield is very probably the result of a surface topography-binding energy combined effect.