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Modeling of resistance changes based on the free volume in VLSI interconnection electromigration

Zong Zhao-Xiang Du Lei Zhuang Yi-Qi He Liang Wu Yong

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Modeling of resistance changes based on the free volume in VLSI interconnection electromigration

Zong Zhao-Xiang, Du Lei, Zhuang Yi-Qi, He Liang, Wu Yong
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  • Abstract views:  7513
  • PDF Downloads:  1345
  • Cited By: 0
Publishing process
  • Received Date:  06 February 2005
  • Accepted Date:  23 June 2005
  • Published Online:  05 June 2005

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