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Influence of Si—OH groups on properties and avoidance for SiCOH films prepared by decamethylcyclopentasiloxane electron cyclotron resonance plasma

Ye Chao Ning Zhao-Yuan Xin Yu Wang Ting-Ting Yu Xiao-Zhu

Citation:

Influence of Si—OH groups on properties and avoidance for SiCOH films prepared by decamethylcyclopentasiloxane electron cyclotron resonance plasma

Ye Chao, Ning Zhao-Yuan, Xin Yu, Wang Ting-Ting, Yu Xiao-Zhu
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  • Abstract views:  8292
  • PDF Downloads:  1780
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Publishing process
  • Received Date:  17 May 2005
  • Accepted Date:  13 September 2005
  • Published Online:  20 May 2006

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