Search

Article

x

留言板

尊敬的读者、作者、审稿人, 关于本刊的投稿、审稿、编辑和出版的任何问题, 您可以本页添加留言。我们将尽快给您答复。谢谢您的支持!

姓名
邮箱
手机号码
标题
留言内容
验证码

Effects of 3 MeV proton irradiations on AlGaN/GaN high electron mobility transistors

Lü Ling Zhang Jin-Cheng Li Liang Ma Xiao-Hua Cao Yan-Rong Hao Yue

Citation:

Effects of 3 MeV proton irradiations on AlGaN/GaN high electron mobility transistors

Lü Ling, Zhang Jin-Cheng, Li Liang, Ma Xiao-Hua, Cao Yan-Rong, Hao Yue
PDF
Get Citation

(PLEASE TRANSLATE TO ENGLISH

BY GOOGLE TRANSLATE IF NEEDED.)

  • AlGaN/GaN high electron mobility transistors (HEMT) are exposed to 3 MeV protons irradiation. The drain saturation current decreases 20% and the maximum transconductance decreases 5% at a fluence of 1× 1015 protons/cm2. As fluence increases, the thread voltage is shifted toward more positive values. After proton irradiation, the gate leakage current increases. The degradation caused by 1.8 MeV proton is significantly higher than by 3 MeV proton irradiation at the same fluence. The radiation damage area and the density of vacancies at a given depth are obtained from software SRIM. As the energy of the incident proton increases, the non-ionizing energy transferred to the crystal lattice decreases. It is concluded that vacancies introduced by proton irradiation may be the primary reason for the degradations of electrical characteristics of AlGaN/GaN HEMT.
    [1]

    Claeys C, Simoen E (Translated by Liu Z L) 2008 Radiation Effectsin Advanced Semiconductor Materials and Devices (Beijing:National Defence Industry Press) p20 (in Chinese) [Claeys C, SimoenE著,刘忠立译 2008 先进半导体材料及器件的辐射效应 (北京:国防工业出版社) 第20页]

    [2]

    Nedelcescu A L, Carlone C, Houdayer A, Bardeleben H J, CantinJ L, Raymond S 2002 IEEE Trans. Nucl. Sci. 49 2733

    [3]

    Aktas O, Kuliev A, Kumar V, Schwindt R, Toshkov S, Costescu D,Stubbins J, Adesida I 2004 Solid-State Electron. 48 471

    [4]

    Gu W P, Zhang J C, Wang C, Feng Q, Ma X H, Hao Y 2009 ActaPhys. Sin. 58 1161 (in Chinese) [谷文萍, 张进城, 王冲,冯倩, 马晓华, 郝跃 2009 物理学报 58 1161

    [5]

    Hu X W, Karmarkar A P, Jun B, Fleetwood D M, Schrimpf R D,Geil R D,Weller R A,White B D, Bataiev M, Brillson L J,MishraU K 2003 IEEE Trans. Nucl. Sci. 50 1791

    [6]

    Kim H Y, Kim J, Yun S P, Kim K R, Anderson T J, Ren F, PeartonS J 2008 J. Electrochem. Soc. 155 H513

    [7]

    Zieglar J F, Ziegler M D, Biersack J P 2010 Nucl. Instrum. MethodsPhys. Res. B 268 1818

    [8]

    White B D, Bataiev M, Goss S H, Hu X, Karmarkar A, FleetwoodD M, Schrimpf R D, Schaff W J, Brillson L J 2003 IEEE Trans.Nucl. Sci. 50 1934

    [9]

    Kalavagunta A, Touboul A, Shen L, Schrimpf R D, Reed R A,Fleetwood D M, Jain R K, Mishra U K 2008 IEEE Trans. Nucl.Sci. 55 2106

    [10]

    Petrosky J C, McClory J W, Gray T E, Uhlman T A 2009 IEEETrans. Nucl. Sci. 56 2905

    [11]

    Xie S Y, Yin J Y, Zhang S, Liu B, Zhou W, Feng Z H 2009 Solid-State Electron. 53 1183

    [12]

    Miller E J, Dang X Z, Wieder H H, Asbeck P M, Yu E T 2000 J.Appl. Phys. 87 8070

  • [1]

    Claeys C, Simoen E (Translated by Liu Z L) 2008 Radiation Effectsin Advanced Semiconductor Materials and Devices (Beijing:National Defence Industry Press) p20 (in Chinese) [Claeys C, SimoenE著,刘忠立译 2008 先进半导体材料及器件的辐射效应 (北京:国防工业出版社) 第20页]

    [2]

    Nedelcescu A L, Carlone C, Houdayer A, Bardeleben H J, CantinJ L, Raymond S 2002 IEEE Trans. Nucl. Sci. 49 2733

    [3]

    Aktas O, Kuliev A, Kumar V, Schwindt R, Toshkov S, Costescu D,Stubbins J, Adesida I 2004 Solid-State Electron. 48 471

    [4]

    Gu W P, Zhang J C, Wang C, Feng Q, Ma X H, Hao Y 2009 ActaPhys. Sin. 58 1161 (in Chinese) [谷文萍, 张进城, 王冲,冯倩, 马晓华, 郝跃 2009 物理学报 58 1161

    [5]

    Hu X W, Karmarkar A P, Jun B, Fleetwood D M, Schrimpf R D,Geil R D,Weller R A,White B D, Bataiev M, Brillson L J,MishraU K 2003 IEEE Trans. Nucl. Sci. 50 1791

    [6]

    Kim H Y, Kim J, Yun S P, Kim K R, Anderson T J, Ren F, PeartonS J 2008 J. Electrochem. Soc. 155 H513

    [7]

    Zieglar J F, Ziegler M D, Biersack J P 2010 Nucl. Instrum. MethodsPhys. Res. B 268 1818

    [8]

    White B D, Bataiev M, Goss S H, Hu X, Karmarkar A, FleetwoodD M, Schrimpf R D, Schaff W J, Brillson L J 2003 IEEE Trans.Nucl. Sci. 50 1934

    [9]

    Kalavagunta A, Touboul A, Shen L, Schrimpf R D, Reed R A,Fleetwood D M, Jain R K, Mishra U K 2008 IEEE Trans. Nucl.Sci. 55 2106

    [10]

    Petrosky J C, McClory J W, Gray T E, Uhlman T A 2009 IEEETrans. Nucl. Sci. 56 2905

    [11]

    Xie S Y, Yin J Y, Zhang S, Liu B, Zhou W, Feng Z H 2009 Solid-State Electron. 53 1183

    [12]

    Miller E J, Dang X Z, Wieder H H, Asbeck P M, Yu E T 2000 J.Appl. Phys. 87 8070

Metrics
  • Abstract views:  7069
  • PDF Downloads:  892
  • Cited By: 0
Publishing process
  • Received Date:  26 April 2011
  • Accepted Date:  07 July 2011
  • Published Online:  05 March 2012

/

返回文章
返回