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Effect of co-implantation of nitrogen and fluorine on the fixed positive charge density of the buried oxide layer in SIMOX SOI materials

Zhang Bai-Qiang Zheng Zhong-Shan Yu Fang Ning Jin Tang Hai-Ma Yang Zhi-An

Citation:

Effect of co-implantation of nitrogen and fluorine on the fixed positive charge density of the buried oxide layer in SIMOX SOI materials

Zhang Bai-Qiang, Zheng Zhong-Shan, Yu Fang, Ning Jin, Tang Hai-Ma, Yang Zhi-An
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  • Abstract views:  5405
  • PDF Downloads:  606
  • Cited By: 0
Publishing process
  • Received Date:  11 January 2013
  • Accepted Date:  21 February 2013
  • Published Online:  05 June 2013

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