A diagnosis of gas-phase processes in a high pressure DC CH4/H2 plasma

Zheng Shi-Jian; Ding Fang; Xie Xin-Hua; Tang Zhong-Liang; Zhang Yi-Chuan; Li Huan; Yang Kuan; Zhu Xiao-Dong

doi:10.7498/aps.62.165204

Abstract

In this work, gas phase processes in a high pressure (～100 Torr) DC hydrocarbon plasma are investigated in situ by optical emission spectroscopy and mass spectroscopy. In the high pressure plasma, optical emission characteristics of glow layers are obviously different. C2, CH dominated band spectra and discrete spectra are distinctively observed in the positive column, whereas the emission intensity is found to decrease in the anode region. In the cathode region, a large number of complicated spectra are detected, which indicates the intensive interaction between the cathode and plasma under high pressure induces complicated atomic and molecular processes. With the the increase of pressure, electron excitation temperature decreases while gas rotational temperature goes up. High methane concentration causes increases in C2, C2H2 and C2H4 but a reduction in C2H6. Those suggest that the effect of gas temperature on gas phase process is significantly enhanced under high pressure.

Keywords:

Authors and contacts

1.
CAS key Laboratory of Basic Plasma Physics, Department of Modern Physics, University of Science and Technology of China, Hefei 230026, China
Funds: Project supported by the National Natural Science Foundation of China (Grant No. 11075158) and the Fund for Fostering Talents in Basic Science of the National Natural Science Foundation of China (Grant No. J1103207).

References

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Cited By

[1]	Ding F, Zhu X D, Zhan R J, Ni T L, Ke B, Zhou H Y, Chen M D, Wen X H 2009 Appl. Phys. Lett. 95 121501
[2]	Sciortino S, Lagomarsino S, Pieralli F, Borchi E, Galvanetto E 2002 Diamond Relat. Mater. 11 573
[3]	Lee W S, Baik Y J, Chae K W 2003 Thin Solid Films 435 89
[4]	Vladimirov S V, Ostrikov K 2004 Phys. Rep. 393 175
[5]	Suzuki K, Sawabe A, Inuzuka T 1990 Jpn. J. Appl. Phys. I 29 153
[6]	Baik Y J, Lee J K, Lee W S, Eun K Y 1999 Thin Solid Films 341 202
[7]	Lee J K, Eun K Y, Baik Y J, Cheon H J, Rhyu J W, Shin T J, Park J W 2002 Diamond Relat. Mater. 11 463
[8]	Chen J Y, Dong L F, Li Y Y, Song Q, Ji Y F 2012 Acta Phys. Sin. 61 075211 (in Chinese) [陈俊英, 董丽芳, 李媛媛, 宋倩, 嵇亚飞 2012 物理学报 61 075211]
[9]	Laux C O, Spence T G, Kruger C H 2003 Plasma Sources Sci. Technol. 12 125
[10]	Staack D, Farouk B, Gutsol A F, Fridman A A 2006 Plasma Sources Sci. Technol. 15 818
[11]	Heintze M, Magureanu M, Kettlitz M 2002 J. Appl. Phys. 92 7022
[12]	Zhou H Y, Watanabe J, Miyake M, Ogino A, Nagatsu M, Zhan R J 2007 Diamond Relat. Mater. 16 675

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Vol. 62, Issue 16 - 2013-08-20

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