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In this article we use phase resolved optical emission spectroscopy to study emission pattern in plasma sheath of dual frequency capacitively coupled plasma in Ar and Ar-O2 discharge. Two emission patterns are found in sheath region of radio frequency coupled powered electrode. The first pattern is related to electron impact excitation because of the sheath expansion. The second pattern is caused by electron impact excitation of secondary electrons. Two emission patterns are also highly modulated with the low frequency cycle. Under the condition of argon discharge, the emission intensities of the two excitation processes are very similar. The emission structure by secondary electrons becomes weak with the increase of O2 content in the gas mixture. In addition, we also use phase resolved optical emission spectroscopy to study low frequency cycle averaged axial emission profile of excited atomic argon at 751 nm in Ar-O2 mixture gas. Distance from the powered electrode (about 3.8 mm) is defined as the boundary sheath of dual frequency capacitively coupled plasma.
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Keywords:
- dual frequency capacitively coupled plasma /
- plasma sheaths /
- optical emission spectroscopy
[1] Lieberman M A 2005 The 27th International Conference on Pheno-mena in Ionised Gases Eindhoven, the Netherlands, July 17-22, 2005 p6
[2] [3] Boyle P C, Ellingboe A R, Turner M M 2004 Plasma Sour. Sci. Technol. 13 493
[4] Kitajima T, Takeo Y, Petrovic Z L, Makabe T 2000 Appl. Phys. Lett. 77 489
[5] [6] Denda T, Miyoshi Y, Komukai Y, Goto T, Petrovic Z L, Makabe T 2004 J. Appl. Phys. 95 870
[7] [8] Kawamura E, Lieberman M A, Lichtenberg A J 2006 Phys. Plasmas 13 053506
[9] [10] Turner M M, Chabert P 2006 Phys. Rev. Lett. 96 205001
[11] [12] [13] Jiang X Z, Liu Y X, Yang S, Lu W Q, Bi Z H, Li X S, Wang Y N 2011 J. Vac. Sci. Technol. A 29 011006
[14] Yuan Q H, Yin G Q, Xin Y, Ning Z Y 2011 Phys. Plasmas 18 053501
[15] [16] Liu Y X, Zhang Q Z, Jiang W, Hou L J, Jiang X Z, Lu W Q, Wang Y N 2011 Phys. Rev. Lett. 107 055002
[17] [18] [19] Schulze J, Schngel E, Donk Z, Luggenhlscher D, Czarnetzki U 2010 J. Phys. D: Appl. Phys. 43 124016
[20] [21] de Rosny G, Mosburg E R, Abelson J R, Devaud G, Kerns R C 1983 J. Appl. Phys. 54 2272
[22] [23] Ishimaru M, Ohba T, Ohmori T, Yagisawa T, Kitajima T, Makabe T 2008 Appl. Phys. Lett. 92 071501
[24] [25] Mahony C M O, Graham W G 1999 IEEE Trans. Plasma Sci. 27 72
[26] [27] Mahony C M O, Wazzan R A, Graham W G 1997 Appl. Phys. Lett. 71 608
[28] [29] Dittmann K 2009 Ph. D. Dissertation (Greifswald: Ernst-Moritz-Arndt University of Greifswald)
[30] Mutsukura N, Kobayashi K, Machi Y 1989 J. Appl. Phys. 66 4688
[31] [32] Dittmann K, Drozdov D, Krames B, Meichsner J 2007 J. Phys. D: Appl. Phys. 40 6593
[33] [34] Dittmann K, Matyash K, Nemschokmichal S, Meichsner J, Schneider R 2010 Contrib. Plasma. Phys. 50 942
[35] [36] [37] Gans T, Der Gathen V S V, Czarnetzki U, Dobele H F 2002 Contrib. Plasma Phys. 42 596
[38] [39] Gans T, Lin C C, Schulz von der Gathen V, Dbele H F 2003 Phys. Rev. A 67 012707
[40] Gans T, Schulz von der Gathen V, Dbele H F 2004 Contrib. Plasma Phys. 44 523
[41] [42] [43] Booth J P, Hancock G, Perry N D, Toogood M J 1989 J. Appl. Phys. 66 5251
[44] [45] Gans T, Gathen V S-v d, Dbele H F 2001 Plasma Sour. Sci. Technol. 10 17
[46] [47] Gans T, Schulze J, OConnell D, Czarnetzki U, Faulkner R, Ellingboe A R, Turner M M 2006 Appl. Phys. Lett. 89 261502
[48] [49] Schulze J, Gans T, OConnell D, Czarnetzki U, Ellingboe A R, Turner M M 2007 J. Phys. D: Appl. Phys. 40 7008
[50] Jiang X Z, Liu Y X, Bi Z H, Lu W Q, Wang Y N 2012 Acta Phys. Sin. 61 015204 (in Chinese) [蒋相站, 刘永新, 毕振华, 陆文琪, 王友年 2012 物理学报 61 015204]
[51] [52] [53] National Institute of Standards and Technology Atomic Spectra Database, ASD Version 3, www.physics.nist.gov [2013]
[54] [55] Sadeghi N, Setser D W, Francis A, Czarnetzki U, Dbele H F 2001 J. Chem. Phys. 115 3144
[56] [57] Czarnetzki U, Luggenhlscher D, Dbele H F 1998 Plasma Sources Sci. Technol. 8 230
[58] [59] Gans T, Lin C C, Schulz von der Gathen V, Dbele H F 2001 J. Phys. D: Appl. Phys. 34 L39
[60] [61] Mutsukura N, Kobayashi K, Machi Y 1989 J. Appl. Phys. 66 4688
[62] [63] Mutsukura N, Kobayashi K, Machi Y 1990 J. Appl. Phys. 68 2657
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[1] Lieberman M A 2005 The 27th International Conference on Pheno-mena in Ionised Gases Eindhoven, the Netherlands, July 17-22, 2005 p6
[2] [3] Boyle P C, Ellingboe A R, Turner M M 2004 Plasma Sour. Sci. Technol. 13 493
[4] Kitajima T, Takeo Y, Petrovic Z L, Makabe T 2000 Appl. Phys. Lett. 77 489
[5] [6] Denda T, Miyoshi Y, Komukai Y, Goto T, Petrovic Z L, Makabe T 2004 J. Appl. Phys. 95 870
[7] [8] Kawamura E, Lieberman M A, Lichtenberg A J 2006 Phys. Plasmas 13 053506
[9] [10] Turner M M, Chabert P 2006 Phys. Rev. Lett. 96 205001
[11] [12] [13] Jiang X Z, Liu Y X, Yang S, Lu W Q, Bi Z H, Li X S, Wang Y N 2011 J. Vac. Sci. Technol. A 29 011006
[14] Yuan Q H, Yin G Q, Xin Y, Ning Z Y 2011 Phys. Plasmas 18 053501
[15] [16] Liu Y X, Zhang Q Z, Jiang W, Hou L J, Jiang X Z, Lu W Q, Wang Y N 2011 Phys. Rev. Lett. 107 055002
[17] [18] [19] Schulze J, Schngel E, Donk Z, Luggenhlscher D, Czarnetzki U 2010 J. Phys. D: Appl. Phys. 43 124016
[20] [21] de Rosny G, Mosburg E R, Abelson J R, Devaud G, Kerns R C 1983 J. Appl. Phys. 54 2272
[22] [23] Ishimaru M, Ohba T, Ohmori T, Yagisawa T, Kitajima T, Makabe T 2008 Appl. Phys. Lett. 92 071501
[24] [25] Mahony C M O, Graham W G 1999 IEEE Trans. Plasma Sci. 27 72
[26] [27] Mahony C M O, Wazzan R A, Graham W G 1997 Appl. Phys. Lett. 71 608
[28] [29] Dittmann K 2009 Ph. D. Dissertation (Greifswald: Ernst-Moritz-Arndt University of Greifswald)
[30] Mutsukura N, Kobayashi K, Machi Y 1989 J. Appl. Phys. 66 4688
[31] [32] Dittmann K, Drozdov D, Krames B, Meichsner J 2007 J. Phys. D: Appl. Phys. 40 6593
[33] [34] Dittmann K, Matyash K, Nemschokmichal S, Meichsner J, Schneider R 2010 Contrib. Plasma. Phys. 50 942
[35] [36] [37] Gans T, Der Gathen V S V, Czarnetzki U, Dobele H F 2002 Contrib. Plasma Phys. 42 596
[38] [39] Gans T, Lin C C, Schulz von der Gathen V, Dbele H F 2003 Phys. Rev. A 67 012707
[40] Gans T, Schulz von der Gathen V, Dbele H F 2004 Contrib. Plasma Phys. 44 523
[41] [42] [43] Booth J P, Hancock G, Perry N D, Toogood M J 1989 J. Appl. Phys. 66 5251
[44] [45] Gans T, Gathen V S-v d, Dbele H F 2001 Plasma Sour. Sci. Technol. 10 17
[46] [47] Gans T, Schulze J, OConnell D, Czarnetzki U, Faulkner R, Ellingboe A R, Turner M M 2006 Appl. Phys. Lett. 89 261502
[48] [49] Schulze J, Gans T, OConnell D, Czarnetzki U, Ellingboe A R, Turner M M 2007 J. Phys. D: Appl. Phys. 40 7008
[50] Jiang X Z, Liu Y X, Bi Z H, Lu W Q, Wang Y N 2012 Acta Phys. Sin. 61 015204 (in Chinese) [蒋相站, 刘永新, 毕振华, 陆文琪, 王友年 2012 物理学报 61 015204]
[51] [52] [53] National Institute of Standards and Technology Atomic Spectra Database, ASD Version 3, www.physics.nist.gov [2013]
[54] [55] Sadeghi N, Setser D W, Francis A, Czarnetzki U, Dbele H F 2001 J. Chem. Phys. 115 3144
[56] [57] Czarnetzki U, Luggenhlscher D, Dbele H F 1998 Plasma Sources Sci. Technol. 8 230
[58] [59] Gans T, Lin C C, Schulz von der Gathen V, Dbele H F 2001 J. Phys. D: Appl. Phys. 34 L39
[60] [61] Mutsukura N, Kobayashi K, Machi Y 1989 J. Appl. Phys. 66 4688
[62] [63] Mutsukura N, Kobayashi K, Machi Y 1990 J. Appl. Phys. 68 2657
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