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Study on the annealing growth of Ge dots at high deposition rate by using magnetron sputtering technique

Zhang Xin-Xin Jin Ying-Xia Ye Xiao-Song Wang Chong Yang Yu

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Study on the annealing growth of Ge dots at high deposition rate by using magnetron sputtering technique

Zhang Xin-Xin, Jin Ying-Xia, Ye Xiao-Song, Wang Chong, Yang Yu
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  • Abstract views:  4875
  • PDF Downloads:  531
  • Cited By: 0
Publishing process
  • Received Date:  24 December 2013
  • Accepted Date:  08 April 2014
  • Published Online:  05 August 2014

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