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Micro-nano photonic structures, such as meta-materials and photonic crystals, having special effects on light generation, transmission, detection and sensing on a submicron scale, play an increasingly significant role in optical information fields. Micro-nano photonic structures have great potential applications in surface laser emission, optical waveguide and high-Q laser. There are several methods to fabricate micro-nano photonic structures, including laser direct writing, electron beam direct writing, electrochemical corrosion, and holographic lithography and so on. Holographic lithography employs multi-beam interference to generate periodic patterns and records them on photosensitive materials to form typical structures. What is more, it has advantages of low cost, large area and high efficiency. However, there are still some challenges in fabricating typical micro-nano photonic structures, especially the precise optical alignment, beam polarization and control of the details of local interference pattern. A specially designed prism is employed in this work and we propose a compact symmetry-lost setup with the rapid adjustment of beam configuration and polarization. Based on the theory of multi-beam interference, symmetry-lost four-and five-beam interference with different polarizations are simulated. By changing the combination of beam configuration and polarization, novel two-dimensional micro-nano photonic structures can be achieved. The variations of azimuthal angle and polarization of beam in symmetry-lost system affect the wave vector difference, and thus changing the lattice shape and structure contrast. Branch-like and wave-like structures are generated by symmetry-lost four beams with polarizations of (90, 90, 90, 90) and five beams with polarizations of (90, 90, 90, 90, 0), respectively. An appropriate threshold is selected in simulation, such that the intensity data larger than the threshold are removed, while the smaller data are remained, which is transformed into an optical lattice pattern. The interference structures show different morphologies and structural contrasts, and have a period of several hundred nanometers. In experimental fabrication, a top-cut hexagonal prism is used to generate two-dimensional micro-nano photonic structure on CHP-C positive photoresist by single exposure. The intensity of each beam is about 18-20 mW, and the incident angle is 42. The beam polarization is adjusted by rotating a half waveplate inside the holes of the mask and structure volume fraction is determined by exposure dose controlled by beam intensity and exposure time. The scanning electron microscope images of the samples show good agreement with simulation results. This study could provide an effective method of fabricating novel photonic structures, which can be used as templates of fabricating different types of metal lattice structures, thereby promoting the development and applications of novel photonic devices.
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Keywords:
- multi-beam interference /
- symmetry-lost /
- photonic structures /
- polarization
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[24] Wang X, Tam W Y 2006 Acta Phys. Sin. 55 5398 (in Chinese) [王霞, 谭永炎 2006 物理学报 55 5398]
[25] Wang X, Wang Z X, L H, Zhao Q L 2010 Acta Phys. Sin. 59 4656 (in Chinese) [王霞, 王自霞, 吕浩, 赵秋玲 2010 物理学报 59 4656]
[26] Zhao Q L, L H, Zhang Q Y, Niu D J, Wang X L 2013 Acta Phys. Sin. 62 044208 (in Chinese) [赵秋玲, 吕浩, 张清悦, 牛东杰, 王霞 2013 物理学报 62 044208]
[27] L H, Zhang Q Y, Zhao Q L, Wang X 2012 Appl. Opt. 51 302
[28] Wang X, Xu J, Lee J C W, Tam W Y 2006 Appl. Phys. Lett. 88 051901
[29] L H, Wang S Z, Wang X 2014 Chin. J. Lasers 41 201 (in Chinese) [吕浩, 王守智, 王霞 2014 中国激光 41 201]
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[1] Yablonovitch E 1987 Phys. Rev. Lett. 58 2059
[2] John S 1987 Phys. Rev. Lett. 58 2486
[3] Luk'yanchuk B, Zheludev N I, Maier S A, Halas N J, Nordlander P, Giessen H, Chong C T 2010 Nat. Mater. 9 707
[4] Schurig D, Mock J J, Justice B J, Cummer S A, Pendry J B, Starr A F, Smith D R 2006 Science 314 977
[5] Fang N, Lee H, Sun C, Zhang X 2005 Science 308 534
[6] Driscoll T, Basov D N, Starr A F, Smith D R 2006 Appl. Phys. Lett. 88 081101
[7] Yang Y, Li Q, Wang G P 2008 Opt. Express 16 11275
[8] Li Z, Zhao R, Koschny T, Kafesaki M, Alici K B, Colak E, Caglayan H, Ozbay E, Soukoulis C M 2010 Appl. Phys. Lett. 97 081901
[9] Phan A H, Piao M, Park J H, Kim N 2013 Appl. Opt. 52 2385
[10] Rill M S, Plet C, Thiel M, Staude I, Freymann G V, Linden S, Wegener M 2008 Nat. Mater. 7 543
[11] de Vittorio M, Todaro M T, Stomeo T, Cingolani R, Cojoc D, Fabriziob E D 2004 Microelectron. Eng. 73-74 388
[12] Birner A, Grning U, Ottow S, Schneider A, Mller F, Lehmann V, Foell H, Gsele U 1998 Phys. Status Solidi A 165 111
[13] Campbell M, Sharp D N, Harrison M T, Denning R G 2000 Nature 404 53
[14] L H, Chu C X, You K, Zhao Q L, Wang X 2017 Optik 140 25
[15] Shen K, Jiang G, Mao W, Baig S, Wang M R 2013 Appl. Opt. 52 6474
[16] Jimnez-Ceniceros A, Trejo-Durn M, Alvarado-Mndez E, Castao V M 2010 Opt. Commun. 283 362
[17] Wang J L, Chen H M 2007 Acta Phys. Sin. 56 922 (in Chinese) [汪静丽, 陈鹤鸣 2007 物理学报 56 922]
[18] Nian X Z, Chen H M 2009 Opt. Laser Technol. 7 23 (in Chinese) [年秀芝, 陈鹤鸣 2009 光学与光电技术 7 23]
[19] Zeng J, Pan J Y, Dong J W, Wang H Z 2006 Acta Phys. Sin. 55 2785 (in Chinese) [曾隽, 潘杰勇, 董建文, 汪河洲 2006 物理学报 55 2785]
[20] Pan J Y, Liang G Q, Mao W D, Wang H Z 2006 Acta Phys. Sin. 55 729 (in Chinese) [潘杰勇, 梁冠全, 毛卫东, 汪河洲 2006 物理学报 55 729]
[21] Solak H H 2005 Microelectron. Eng. 78 410
[22] Lai N D, Lin J H, Hsu C C 2007 Appl. Opt. 46 5645
[23] Wang X, Xu J F, Su H M, He Y J, Jiang S J, Wang H Z 2006 Acta Phys. Sin. 55 5398 (in Chinese) [王霞, 谭永炎 2006 物理学报 55 5398]
[24] Wang X, Tam W Y 2006 Acta Phys. Sin. 55 5398 (in Chinese) [王霞, 谭永炎 2006 物理学报 55 5398]
[25] Wang X, Wang Z X, L H, Zhao Q L 2010 Acta Phys. Sin. 59 4656 (in Chinese) [王霞, 王自霞, 吕浩, 赵秋玲 2010 物理学报 59 4656]
[26] Zhao Q L, L H, Zhang Q Y, Niu D J, Wang X L 2013 Acta Phys. Sin. 62 044208 (in Chinese) [赵秋玲, 吕浩, 张清悦, 牛东杰, 王霞 2013 物理学报 62 044208]
[27] L H, Zhang Q Y, Zhao Q L, Wang X 2012 Appl. Opt. 51 302
[28] Wang X, Xu J, Lee J C W, Tam W Y 2006 Appl. Phys. Lett. 88 051901
[29] L H, Wang S Z, Wang X 2014 Chin. J. Lasers 41 201 (in Chinese) [吕浩, 王守智, 王霞 2014 中国激光 41 201]
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