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Influneces of different oxygen partial pressures on switching properties of Ni/HfOx/TiN resistive switching devices

Zhang Zhi-Chao Wang Fang Wu Shi-Jian Li Yi Mi Wei Zhao Jin-Shi Zhang Kai-Liang

Citation:

Influneces of different oxygen partial pressures on switching properties of Ni/HfOx/TiN resistive switching devices

Zhang Zhi-Chao, Wang Fang, Wu Shi-Jian, Li Yi, Mi Wei, Zhao Jin-Shi, Zhang Kai-Liang
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  • Abstract views:  5397
  • PDF Downloads:  236
  • Cited By: 0
Publishing process
  • Received Date:  10 October 2017
  • Accepted Date:  05 December 2017
  • Published Online:  05 March 2018

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