Three-dimensional numerical simulation of physical field distribution of radio frequency thermal plasma

Zhu Hai-Long; Li Xue-Ying; Tong Hong-Hui

doi:10.7498/aps.70.20202135

Abstract

Radio frequency (RF) thermal plasma involves abundant and complex physics. The understanding of the physical field distributions of the RF thermal plasma is helpful to its applications in industrial field. In this paper, an electro-thermal-magnetic-flow strong coupling mathematical and physical model of three-dimensional RF thermal plasma is established, the actual solenoid structure of the induction coil is considered, and a C++ code is developed for calculating the complex electromagnetic field in a customized version of the computational fluid dynamics commercial code FLUENT. The physical fields of RF thermal plasma, such as temperature field, flow field and electromagnetic field are studied. The electrical conductivity, thermal conductivity and viscosity distribution of the plasma are investigated. The results show that the physical field distribution of RF thermal plasma has an important non-axisymmetric three-dimensional effect due to the actual shape of the non-axisymmetric induction coil structure. The plasma discharge presents an annular distribution with a certain deflection angle. The distribution of plasma flow field shows a non-axisymmetric electromagnetic pump effect which is different from that of the two-dimensional model. The results have great guiding significance for optimizing and controlling the RF thermal plasma in various application areas.

Keywords:

Authors and contacts

1.
College of Physics and Electronic Engineering, Shanxi University, Taiyuan 030006, China
2.
Institute of Theoretical Physics of Shanxi University, Taiyuan 030006, China
3.
Southwestern Institute of Physics, Chengdu 610041, China

Corresponding author: Zhu Hai-Long, zhuhl@sxu.edu.cn

Funds: Project supported by the National Natural Science Foundation of China (Grant Nos. 11875039, 11535003)

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References

[1]	Murphy A B, Uhrlandt D 2018 Plasma Sources Sci. Technol. 27 063001 Google Scholar
[2]	Mostaghimi J, Boulos M I 2015 Plasma Chem. Plasma Process. 35 421 Google Scholar
[3]	Yu C F, Zhou X, Wang D Z, Linh N Van, Liu W 2018 Plasma Sci. Technol. 20 14019 Google Scholar
[4]	Zhu H L, Tong H H, Cheng C M, Liu N 2017 Int. J. Refract. Met. Hard Mater. 66 76 Google Scholar
[5]	Li J L, Hu R J, Qu H, Su Y, Wang N, Su H Q, Gu X J 2019 Appl. Catal. B 249 63 Google Scholar
[6]	Oh J W, Na H, Cho Y S, Choi H 2018 Nanoscale Res. Lett. 13 1 Google Scholar
[7]	Hou H D, Veilleux J, Gitzhofer F, Wang Q S 2020 Surf. Coat. Technol. 393 125803 Google Scholar
[8]	Kulacki F A 2017 Handbook of Thermal Science and Engineering (Berlin: Springer) pp2923−3005
[9]	Altenberend J, Chichignoud G, Delannoy Y 2012 Plasma Sources Sci. Technol. 21 045011 Google Scholar
[10]	Razzak M A, Kondo K, Uesugi Y, Ohno N, Takamura S 2004 J. Appl. Phys. 95 427 Google Scholar
[11]	朱海龙 2014 博士学位论文(成都: 核工业西南物理研究院) Zhu H L 2014 Ph. D. Dissertation (Chengdu: Southwestern Institute of Physics) (in Chinese)
[12]	Xue S W, Proulx P, Boulos M I 2001 J. Phys. D: Appl. Phys. 34 1897 Google Scholar
[13]	Bernardi D, Colombo V, Ghedini E, Mentrelli A 2003 Eur. Phys. J. D 27 55 Google Scholar
[14]	Watanabe T, Atsuchi N, Shigeta M 2007 Thin Solid Films 515 4209 Google Scholar
[15]	Tanaka Y 2004 J. Phys. D: Appl. Phys. 37 1190 Google Scholar
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[17]	Bernardi D, Colombo V, Ghedini E, Mentrelli A 2003 Eur. Phys. J. D 25 279 Google Scholar
[18]	Miller R C, Ayen R J 1969 J. Appl. Chem. 40 5260
[19]	ANSYS FLUENT 15 Documentation, Theory Guide 2013 (Canonsburg, PA: ANSYS. Inc.)
[20]	Boulos M I, Fauchais P, Pfender E 1994 Thermal Plasmas Fundamentals and Applications (Vol. 1) (New York: Plenum Press) p162
[21]	Boulos M I 1985 Pure Appl. Chem. 57 1321 Google Scholar
[22]	Chen L J, Chen W B, Liu C D, Tong H H, Zhao Q 2019 Plasma Sci. Technol. 21 074006 Google Scholar
[23]	Punjabi S B, Das T K, Joshi N K, Mangalvedekar H A, Lande B K, Das A K 2010 J. Phys. Conf. Ser. 208 012048 Google Scholar
[24]	Bernardi D, Colombo V, Ghedini E, Mentrelli A 2005 Pure Appl. Chem. 77 359 Google Scholar
[25]	陈熙 2009 热等离子体传热与流动 (北京: 科学出版社) 第28页 Chen X 2009 Heat Transfer and Flow of Thermal Plasma (Beijing: Science Press) p28 (in Chinese)
[26]	Schreuders C 2006 Ph. D. Dissertation (Limoges: University of limoges)
[27]	Raizer Y P 1987 Gas Discharge Physics (Berlin: Springer-Verlag) p14
[28]	Boulos M I 1991 IEEE Trans. Plasma Sci. 19 1078 Google Scholar
[29]	Kong P C, Lau Y C 1990 Pure Appl. Chem. 62 1809 Google Scholar
[30]	Mauer G, Vaβen R, Stöver D, Kirner S, Marqués J L, Zimmermann S, Forster G, Schein J 2011 J. Therm. Spray Technol. 20 3 Google Scholar
[31]	Yu M H, Yamada K, Takahashi Y, Liu K, Zhao T 2016 Phys. Plasmas 23 123523 Google Scholar

Cited By

图 1 等离子体炬及腔室　(a)几何结构示意图; (b)计算域和网格结构

Figure 1. Plasma torch system: (a) Geometric structure; (b) computational domain and grid.

DownLoad: Full-Size Img PowerPoint

图 2 射频电源电路框图

Figure 2. Diagram of radio frequency power supply circuit.

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图 3 磁矢势A_x分布图　(a)实部; (b)虚部

Figure 3. Distribution of magnetic vector potential A_x: (a) Real part; (b) imaginary part.

DownLoad: Full-Size Img PowerPoint

图 4 磁矢势A_y分布图　(a)实部; (b)虚部

Figure 4. Distribution of magnetic vector potential A_y: (a) Real part; (b) imaginary part.

DownLoad: Full-Size Img PowerPoint

图 5 磁矢势A_z分布图　(a)实部; (b)虚部

Figure 5. Distribution of magnetic vector potential A_z: (a) Real part; (b) imaginary part.

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图 6 YZ平面上的磁感应强度B分布　(a)实部; (b)虚部

Figure 6. Distribution of magnetic flux density on YZ plane: (a) Real part; (b) imaginary part.

DownLoad: Full-Size Img PowerPoint

图 7 XY平面上的电场E分布, z = 180 mm

Figure 7. Electric field distribution on the XY plane, z = 180 mm.

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图 8 温度场场分布图　(a) YZ平面; (b) XZ平面; (c) XY平面, z = 180 mm

Figure 8. Temperature field distribution: (a) YZ plane; (b) XZ plane; (c) XY plane, z = 180 mm.

DownLoad: Full-Size Img PowerPoint

图 9 (a)焦耳热分布; (b) XY 平面上的焦耳热, z = 180 mm; (c)焓值分布

Figure 9. (a) Joule heat distribution; (b) Joule heat distribution on the XY plane, z = 180 mm; (c) enthalpy distribution.

DownLoad: Full-Size Img PowerPoint

图 10 (a)电导率分布; (b)热导率分布; (c)黏性系数分布

Figure 10. (a) Electrical conductivity distribution; (b) thermal conductivity distribution; (c) viscosity distribution.

DownLoad: Full-Size Img PowerPoint

图 11 (a)速度场V_z; (b)流场; (c)二维流场^[4]

Figure 11. (a) Velocity field V_z; (b) flow field; (c) two dimensional flow field^[4].

DownLoad: Full-Size Img PowerPoint

图 12 射频热等离子体流场放大图

Figure 12. Magnified view of radio frequency thermal plasma flow field.

DownLoad: Full-Size Img PowerPoint

图 13 洛伦兹力F_x矢量分布图

Figure 13. Lorentz force distribution(F_x).

DownLoad: Full-Size Img PowerPoint

表 1 等离子体炬及腔室几何尺寸表

Table 1. Dimensions of the plasma system sketched in Fig. 1

参数名称	数值
陶瓷约束管内半径/外半径/长度/mm	25/29.5/252
送气管内半径/外半径/长度/mm	15.5/19/120
送料枪内半径/外半径/长度/mm	1.5/4.5/186
线圈半径/轴向节距/mm	37/15
线圈螺线管半径/mm	5
线圈匝数	5

DownLoad: CSV

[1]	Murphy A B, Uhrlandt D 2018 Plasma Sources Sci. Technol. 27 063001 Google Scholar
[2]	Mostaghimi J, Boulos M I 2015 Plasma Chem. Plasma Process. 35 421 Google Scholar
[3]	Yu C F, Zhou X, Wang D Z, Linh N Van, Liu W 2018 Plasma Sci. Technol. 20 14019 Google Scholar
[4]	Zhu H L, Tong H H, Cheng C M, Liu N 2017 Int. J. Refract. Met. Hard Mater. 66 76 Google Scholar
[5]	Li J L, Hu R J, Qu H, Su Y, Wang N, Su H Q, Gu X J 2019 Appl. Catal. B 249 63 Google Scholar
[6]	Oh J W, Na H, Cho Y S, Choi H 2018 Nanoscale Res. Lett. 13 1 Google Scholar
[7]	Hou H D, Veilleux J, Gitzhofer F, Wang Q S 2020 Surf. Coat. Technol. 393 125803 Google Scholar
[8]	Kulacki F A 2017 Handbook of Thermal Science and Engineering (Berlin: Springer) pp2923−3005
[9]	Altenberend J, Chichignoud G, Delannoy Y 2012 Plasma Sources Sci. Technol. 21 045011 Google Scholar
[10]	Razzak M A, Kondo K, Uesugi Y, Ohno N, Takamura S 2004 J. Appl. Phys. 95 427 Google Scholar
[11]	朱海龙 2014 博士学位论文(成都: 核工业西南物理研究院) Zhu H L 2014 Ph. D. Dissertation (Chengdu: Southwestern Institute of Physics) (in Chinese)
[12]	Xue S W, Proulx P, Boulos M I 2001 J. Phys. D: Appl. Phys. 34 1897 Google Scholar
[13]	Bernardi D, Colombo V, Ghedini E, Mentrelli A 2003 Eur. Phys. J. D 27 55 Google Scholar
[14]	Watanabe T, Atsuchi N, Shigeta M 2007 Thin Solid Films 515 4209 Google Scholar
[15]	Tanaka Y 2004 J. Phys. D: Appl. Phys. 37 1190 Google Scholar
[16]	Bernardi D, Colombo V, Ghedini E, Mentrelli A 2003 Eur. Phys. J. D 25 271 Google Scholar
[17]	Bernardi D, Colombo V, Ghedini E, Mentrelli A 2003 Eur. Phys. J. D 25 279 Google Scholar
[18]	Miller R C, Ayen R J 1969 J. Appl. Chem. 40 5260
[19]	ANSYS FLUENT 15 Documentation, Theory Guide 2013 (Canonsburg, PA: ANSYS. Inc.)
[20]	Boulos M I, Fauchais P, Pfender E 1994 Thermal Plasmas Fundamentals and Applications (Vol. 1) (New York: Plenum Press) p162
[21]	Boulos M I 1985 Pure Appl. Chem. 57 1321 Google Scholar
[22]	Chen L J, Chen W B, Liu C D, Tong H H, Zhao Q 2019 Plasma Sci. Technol. 21 074006 Google Scholar
[23]	Punjabi S B, Das T K, Joshi N K, Mangalvedekar H A, Lande B K, Das A K 2010 J. Phys. Conf. Ser. 208 012048 Google Scholar
[24]	Bernardi D, Colombo V, Ghedini E, Mentrelli A 2005 Pure Appl. Chem. 77 359 Google Scholar
[25]	陈熙 2009 热等离子体传热与流动 (北京: 科学出版社) 第28页 Chen X 2009 Heat Transfer and Flow of Thermal Plasma (Beijing: Science Press) p28 (in Chinese)
[26]	Schreuders C 2006 Ph. D. Dissertation (Limoges: University of limoges)
[27]	Raizer Y P 1987 Gas Discharge Physics (Berlin: Springer-Verlag) p14
[28]	Boulos M I 1991 IEEE Trans. Plasma Sci. 19 1078 Google Scholar
[29]	Kong P C, Lau Y C 1990 Pure Appl. Chem. 62 1809 Google Scholar
[30]	Mauer G, Vaβen R, Stöver D, Kirner S, Marqués J L, Zimmermann S, Forster G, Schein J 2011 J. Therm. Spray Technol. 20 3 Google Scholar
[31]	Yu M H, Yamada K, Takahashi Y, Liu K, Zhao T 2016 Phys. Plasmas 23 123523 Google Scholar

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Vol. 70, Issue 15 - 2021-08-05

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