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Electron beam pinching is a common physical phenomenon in the working process of high-current electron beam diodes. The radial collapse velocity (Va) of the beam is an important index to determine the beam pinching and the working characteristics of the diode. The current research methods are based on optical diagnosis and theoretical estimation formulas for a specific diode. The radial collapse velocity of Qiangguang-I accelerator’s tight-pinched short γ diode can be obtained by the following three methods in this paper: 1) a theoretical formula, which is used to calculate the radial collapse velocity on the basis of the existing research results, and can very quickly determine the pinching situation because in this case this formula just needs a diode pinching current; 2) the method of calculating Va, which is established based on particle-in-cell simulation. The simulation model includes the anode ion current, thus can simulate the pinching of electron beam more precisely; 3) a method of calculating Va, which is given by measuring the pinch center offset and the γ-ray PIN waveform, because the Qiangguang-I γ diode is inconvenient for optical diagnosis. The radial collapse velocities obtained by the above three methods are 8.43, 8.70 and 7.89 cm2/ns respectively, and the relative difference among the three methods is < 10%. The third method obtains a slightly smaller value because the ion current assumed in the theory and simulation is H+. The ion current composition in the actual diode is complex, the diffusion speed is slower, then the radial collapse velocity is smaller. Compared with the typical Va value (2–4 cm2/ns) of the Gamble II accelerator diode given by the Blaugrund team, the Va value of the short γ diode of the Qiangguang-I accelerator is nearly doubled. The diode on Qiangguang-I, which works after a plasma opening switch (POS), has a very short rising time (less than 10 ns), and pinches quickly. In contrast, the rising time of the Gamble II accelerator diode is about 40 ns, which is different from the working status of the Qiangguang-I diode. This paper provides a new way to study the radial collapse velocity of high-current diodes.
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Keywords:
- tight-pinched /
- high-current electron beam diode /
- radial collapse velocity /
- calculation methods
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Liu X S 2007 Intense Particle Beams and Its Applications (Beijing: National Defense Industry Press) pp201, 202 (in Chinese)
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Google Scholar
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Michatz Г А (translated by Li G Z) 2007 Vacuum Discharge Physics and High-power Pulse Technology (Beijing: National Defense Industry Press) pp249−262 (in Chinese)
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图 1 二极管箍缩过程“四阶段”模型
Figure 1. Four-regime model of high current diode pinching process.
图 2 (a)“强光一号”短γ二极管PIC模型示意图; (b) PIC模拟馈入电压波形
Figure 2. (a) PIC model of the short γ diode on Qiangguang-I accelerator; (b) imported voltage waveform obtained by PIC model.
图 3 “强光一号”短γ二极管“四阶段”箍缩过程PIC仿真结果
Figure 3. Simulation results of the γ diode’s four-regime pinching process.
图 4 阳极离子流模拟结果(H+密度: 1014 cm–3)
Figure 4. Simulation results of ions current (H+ density: 1014 cm–3)
图 5 “强光一号”二极管钽靶实验前后照片 (a) 未使用; (b) shot 18083; (c) shot 19168
Figure 5. Ta target photos used in Qiangguang-I accelerator diode: (a) unused; (b) shot 18083; (c) shot 19168.
图 6 空间不对称影响下箍缩面积计算示意
Figure 6. Pinching aera calculation under the influence of space aaluation.
图 7 箍缩中心偏移现象(虚线、实线交点分别为靶几何中心与箍缩中心)
Figure 7. Phenomenon of pinching center offset.
图 8 “强光一号”短γ二极管电流和PIN波形
Figure 8. Current and PIN waveforms of the short γ diode.
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[1] 刘锡三 2007 强流粒子束及其应用 (北京: 国防工业出版社) 第201, 202页
Liu X S 2007 Intense Particle Beams and Its Applications (Beijing: National Defense Industry Press) pp201, 202 (in Chinese)
[2] Ekdahl C 2002 IEEE Trans. Plasma Sci. 30 254
Google Scholar
[3] 丛培天 2020 强激光与粒子束 32 025002
Google Scholar
Cong P T 2020 High Pow. Las. Part. Beam. 32 025002
Google Scholar
[4] Mesyats G A 2005 Pulsed Power (New York: Springer) p433
[5] Blaugrund A E, Cooperstein G, Goldstein S A 1975 International Topical Conference on Electron Beam Research & Technology Albuquerque, NM, USA, November 3–5, 1975 p13224837
[6] Blaugrund A E, Cooperstein G, Goldstein S A 1977 Phys. Fluids 20 1185
Google Scholar
[7] 丛培天, 陈伟, 韩娟娟, 郭宁, 苏兆峰, 张信军, 王亮平 2010 强激光与粒子束 22 2773
Google Scholar
Cong P T, Chen W, Han J J, Guo N, Su Z F, Zhang X J, Wang L P 2010 High Pow. Las. Part. Beam. 22 2773
Google Scholar
[8] 郭宁, 王亮平, 丛培天, 乔开来, 李岩, 张信军 2010 核电子学与探测技术 30 1196
Google Scholar
Guo N, Wang L P, Cong P T, Qiao K L, Li Yan, Zhang X J, 2010 Nucl. Electron. Detect. Technol. 30 1196
Google Scholar
[9] 孙江, 胡杨, 张金海, 蔡丹, 苏兆锋, 赵博文, 孙铁平, 孙剑锋, 呼义翔, 彭士香 2021 原子能科学技术 55 328
Google Scholar
Sun J, Hu Y, Zhang J H, Cai D, Su Z F, Zhao B W, Sun T P, Sun J F, Hu Y X, Peng S X 2021 Atom. Eng. Sci. Technol. 55 328
Google Scholar
[10] Goldstein S A, Davidson R C, Lee R, Siambis J G 1975 International Topical Conference on Electron Beam Research & Technology Albuquerque, NM, USA, November 3–5, 1975 p13224836
[11] Swanekamp S B, Cooperstein G, Schumer J W, Mosher D, Ottinger P F, Young F C, Cornrnisso R J 2004 International Conference on High-Power Particle Beams St. Petersburg, Russia, July 18−23, 2004 p12821202
[12] Swanekamp S B, Commisso R J, Cooperstein G, Ottinger P F, Schumer J W 2000 Phys. Plasmas 7 5214
Google Scholar
[13] 黄建军 2003 硕士学位论文 (西安: 西北核技术研究所)
Kuai B 2003 M. S. Thesis (Xi’an: Northwest Institute of Nuclear Technology) (in Chinese)
[14] 蒯斌, 邱爱慈, 王亮平, 丛培天, 梁天学 2004 强激光与粒子束 16 1603
Kuai B, Qiu A C, Wang L P, Cong P T, Liang T X, Yin J H 2004 High Pow. Las. Part. Beam. 16 1603
[15] Miller R B 1982 Introduction to the Physics of Intense Charged Particles (New York and London: Plenum Press) pp67−70
[16] Cavalleri G, Spavieri G, Spinelli G 1996 Eur. J. Phys. 17 205
Google Scholar
[17] 李永东, 王洪广, 刘纯亮, 张殿辉, 王建国, 王玥 2009 强激光与粒子束 12 1866
Li Y D, Wang H G, Liu C L, Zhang D H, Wang J G, Wang Y 2009 High Pow. Las. Part. Beam. 12 1866
[18] Sanford T W L, Halbleib J A, Poukey J W, Pregenzer A L, Pate R C, Heath C E, R. Mock G A, Mastin D C Ghiglia T J, Roemer P W, Spence G A 1989 J. Appl. Phys. 66 10
Google Scholar
[19] Cai D, Liu L, Ju J C, Zhang T Y, Zhao X L, Zhou H Y 2015 Phys. Plasmas 22 073108
Google Scholar
[20] Seidel D B, Goplen B C, Van Devender J P 1980 Fourteenth Pulse Power Modulator Symposium Albuquerque, NM, USA, June 3−5, 1990 p1980
[21] Lai D G, Qiu M T, Xu Q F, Huang Z L 2016 Phys. Plasmas 23 8
Google Scholar
[22] 米夏兹 Г А 著 (李国政 译) 2007 真空放电物理和高功率脉冲技术 (北京: 国防工业出版社) 第249−262页
Michatz Г А (translated by Li G Z) 2007 Vacuum Discharge Physics and High-power Pulse Technology (Beijing: National Defense Industry Press) pp249−262 (in Chinese)
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