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中国物理学会期刊

锗中隧道电流过程的理论(Ⅰ)——杂质引起的隧道电流

CSTR: 32037.14.aps.19.25

THEORY OF TUNNELLING PROCESSES IN GERMANIUM TUNNEL DIODES (Ⅰ)——IMPURITY-INDUCED CURRENT

CSTR: 32037.14.aps.19.25
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  • 这工作是对锗中杂质散射引起的隧道电流的理论分析。说明在高掺杂(~1019厘米-3时杂质散射隧道电流是重要的,可以与联系着声子的隧道电流比拟或更大。不同杂质的作用是不同的,AS和P比Sb的强。锗中杂质隧道过程主要是二级过程,由导带底穿入禁带的电子先被杂质场散射到对应于导带(0,0,0)谷的电子状态,然后,再在结势垒场的作用下跃迁到价带。提出了这种过程的理论,得到杂质隧道电流的表达式,说明只有处在势垒区中一定区域(大致是20?左右厚度)中的杂质原子对这个过程有显著贡献。虽然导带底是各向异性的,但这过程的几率却几乎是各向同性的。在附录Ⅱ中还提供了一个在任意形式位垒下直接隧道过程的普遍理论。

     

    A theory is proposed for the impurity-induced tunnelling current which apparently constitutes the major part of the current observed in As and P doped germanium tunnel diodes. The experimental valley-orbit splittings of various donors in. germanium show-that the short range atomic fields of As and P are many times stronger than that of Sb and, for doping levels above 1019/cm3, can be equally or more effective in scattering than phonons. The possible mechanisms for tunnelling caused by impurity scattering are examined; it is found that owing to a special feature of the germanium band structure, namely, (0, 0, 0) conduction band minimum not too high and associated with a particularly small effective mass, a second order process via the (0, 0, 0) minimum should be the dominant process. A method for treating such a second order process is developed, which gives a clear quasi-classical picture of the tunnelling process: an electron tunnelling from a conduction band minimum, when reaching an optimum depth, is scattered inta (0, 0, 0) states and proceeds thereon to the valence band maximum much as in direct tunnelling. An explicit expression for the current is obtained; the magnitude of the current is estimated and a comparison with a similar phonon-assisted current (see accompanying paper II) is made. It is also shown that despite the anisotropic nature of the conduction band minima, the second order current should be nearly direction-independent.

     

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