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中国物理学会期刊

锗中隧道电流过程的理论(Ⅱ)——声子隧道电流

CSTR: 32037.14.aps.19.49

THEORY OF TUNNELLING PROCESSES IN GERMANIUM TUNNEL DIODES (Ⅱ)——PHONON-ASSISTED CURRENT

CSTR: 32037.14.aps.19.49
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  • 本文是对锗中声子散时引起的隧道电流的理论分析。指出这过程主要是二级过程,由导带底进入禁带的电子,被声子散射到联系着导带(0,0,0)谷的状态,再在结势垒场的作用下跃迁到价带。对这过程起主要作用的是在结势垒区中一定区域(大致是20?厚)的晶体原子振动。这过程的几率几乎是各向同性的。从对称性的一般考虑,说明锗中纵声学支格波对隧道过程的贡献是最强的。

     

    The present paper is a sequel to the accompanying paper I, where a theory is given for the impurity-induced current in germanium tunnel diodes. It is pointed out that for reasons similar to those given in connexion with the impurity-induced current, the phonon-assisted current in germanium diodes should be attributed to a second order process via (0, 0, 0) conduction band minimum rather than the first order process hitherto assumed. By methods similar to those developed in I, the second order current expression is deduced and discussed; in particular, symmetry arguments indicate that for the second order process in germanium diodes, the longitudinal acoustic phonons should be by far the most effective, in agreement with existing experimental evidences.

     

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