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本文讨论了影响小注入下晶体管的lc-VBE特性的各种因素。作者发现发射结势垒区准费米能级降落的影响对于解释实验中发现的n*≡d(VBE/VT)/dInlc*值的差分方法。In this paper, we discuss the various factors affecting the Ic-VBE characteristics of a transistor in the low injection level, i.e. the factors to change n*≡ d(VBE/VT)/dlnIc to departe from 1. It is described also an accurate differential method of measuring n* for integrated transistor-pair. We show that the quasi-Fermi potential drop in emitter junction is an important factor in the explaination on the case n*< 1 observed in some transistors.







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