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中国物理学会期刊

GaAs1-xPx(110)清洁表面结构和电子态的研究

CSTR: 32037.14.aps.32.247

THE ATOMIC STRUCTURE AND ELECTRONIC STATES OF GaAs1-xPx (110)

CSTR: 32037.14.aps.32.247
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  • 本文用有限集团的EHT方法研究了GaAs1-xPx(110)清洁表面的弛豫和电子态。出现三元合金的表面旋转弛豫角约为26°左右;当X≥0.25时,在禁带中靠近导带底处有空的本征表面态存在。

     

    In this paper, the clean surface GaAs1-xPx(110) has been studied by the EHT method using a cluster model. We obtained the following results: (1) the value of the rotated relaxation angle is about 26°. (2) For x≥0.25 the empty intrinsic cation states are found in the gap near the conduction band edge.

     

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