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中国物理学会期刊

1.8—4.2K GaAs1-xPx注N+,注Zn+光荧光谱

CSTR: 32037.14.aps.33.833

THE PHOTOLUMINESCENCE SPECTRA OF N+, Zn+ IMPLANTED GaAs1-xPx AT 1.8-4.2 K

CSTR: 32037.14.aps.33.833
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  • 本文研究了1.8—4.2K下离子注N,注ZnGaAs1-xPx样品的光致发光行为。实验结果表明由N-Zn跃迁完全转变到N束缚激子复合的x值依赖N,Zn的浓度。利用Campbell局域化模型计算了N-Zn跃迁与N束缚激子复合的几率比。这一几率比是组分x和N-Zn浓度的函数。在1.8K,在同一样品上我们清晰地观测到对应N-Zn跃迁与N束缚激子复合的光谱。

     

    The photoluminescent behavior of N+ and Zn+ implanted GaAs1-xPx has been investigated at 4.2 K. The experimental results show that the alloy composition x, at which N-Zn transition completely becomes N bound excitonic recombination, depends on the nitrogen and zinc impurity concentration.Using Campbell localized model, we calculated the probability ratio of N-Zn transition to N bound excitonic recombination as a function of composition and N, Zn impurity concentration.At 1.8 K, we have clearly observed the typical spectra of N-Zn transition and N bound excitonic recombination in the same sample.

     

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