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中国物理学会期刊

金属玻璃CuTi合金的电阻率

CSTR: 32037.14.aps.34.652

RESISTIVITY OF METALLIC GLASS CuTi

CSTR: 32037.14.aps.34.652
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  • 选择典型的金属玻璃Cu1-xTix合金系统,利用熔融自旋技术制备了两种组份(x=0.300;x=0.325)的非晶样品。X射线,DTA和DSC测量的结果表明,它们具有典型的非晶特征。在较宽的温区(2—700K)测量了其电阻率,测量结果符合Mooij定则。最后,利用非晶态合金电子输运的Nagel近自由电子模型,Mott的s-d电子散射模型,准粒子无序构形激发模型和“二能级隧道”模型分析了低温电阻率。

     

    We choose the typical metallic glass Cu1-xTix alloys with two concent ations (x= 0.300 and x=0.325) made by melt-spinning technique as the sample. The X-ray diffraction, DTA and DSC analyses show that the samples exhibit typical amorphous charac-teristecs. In the wide temperature range 2-700 K, the resistivity is in aceordance with Mooij rule. Based on the Nagel nearly free electron model, Mott s-d scattering model, quasi-particles excitation by disorder configuration model and two-level tunnelling model for the electrical transport properties of amorphous alloys, the results are analysed,. The theoretical results in two level tunnelling model agree with the experimental data much better.

     

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