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中国物理学会期刊

硼注入砷化镓的电子阻止本领

CSTR: 32037.14.aps.34.968

ELECTRONIC STOPPING POWER OF B+ IMPLANTATION IN GaAs

CSTR: 32037.14.aps.34.968
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  • 由文献上Rp的实验数据,用相对校正法和我们编制的LSS方程数值求解程序,算得B+→GaAs的电子阻止本领为NSe(E)=12.4E0.605,以及B+→GaAs的射程统计参数Rp,△Rp和R⊥。

     

    Based on published experimental data of Rp, a proposed relative correction method combining with numerical solution program of LSS equation was used to calculate the electronic stopping power of B+ implantation in GaAs, as follows NSe(E) = 12.4E0.605,Using this expression, the range statistic parameters Rp,△Rp and R⊥for B+ implanted GaAs were calculated.

     

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