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本文报道了对分子束外延(MBE)生长的In0.25Ga0.75As-GaAs应变层量子阱结构在77K下的压力光荧光(PL)研究的结果。流体静压力从0到50kbar.,给出了In0.25Ga0.75As-GaAs应变层量子阱的Γ谷压力系数,实验观察到了量子阱中能级与势垒GaAs中X谷的能级交叉。通过对其压力行为的分析,给出了In0.25Ga0.75As-GaAs异质结的导带与价带跃变比:Qc=△Ec:△Ev=0.68:0.32。对(InGa)As-GaAs应变量子阱常压下的理论分析与实验符合很好。本文也对Al0.3Ga0.70As-GaAs量子阱进行了讨论。In this article we report the results of photoluminescence studies on In0.25Ga0.75 As-GaAs straiaed quantum wells grown by molecular beam epitaxy under pressure at 77 K. The applied hydrostatic pressure ranges from 0 to 50 kbar. The pressure coefficients of T valley of (InGa)As-GaAs strained quantum wells are presented. We have observed the crossover between the energy level in the well and X valley in the barrier GaAs. With the analysis of its behavior under pressure, the ratio of conduction band offset to valence band offset in In0.25 Ga0.75 As-GaAs heterojunction is determined as Qc =△Ec:△Ev = 0.68:0.32. The theoretical studies on (InGa) AsGaAs strained quantum wells under normal pressure fit the experimental results very well. Some discussions about (AlGa)As-GaAs quantum wells are also included in this paper.







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