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中国物理学会期刊

用反型层模型探讨n—Ge中的常温反常霍耳效应

CSTR: 32037.14.aps.38.1210

INVESTIGATION OF THE ANOMALOUS HALL EFFECT IN n-Ge AT ROOM TEMPERATURE BY THE INVERSION LAYERS MODEL

CSTR: 32037.14.aps.38.1210
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  • 本文用反型层模型,对常温下n-Ge中的反常霍耳效应进行了理论上的定量计算,取得了与实验一致的结果。

     

    In this paper, we make quantitative rheor ncal calculation for the anomalous Hall effect in n-Ge semiconductor at room teperature by use of the inversion layers model. The results are in agreement with the experiments.

     

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