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本文用反型层模型,对常温下n-Ge中的反常霍耳效应进行了理论上的定量计算,取得了与实验一致的结果。In this paper, we make quantitative rheor ncal calculation for the anomalous Hall effect in n-Ge semiconductor at room teperature by use of the inversion layers model. The results are in agreement with the experiments.







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