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中国物理学会期刊

AlxGa1-xAs(100)表面性质的研究

CSTR: 32037.14.aps.38.1968

STUDY ON THE SURFACE PROPERTIES OF AlxGa1-xAs(100)

CSTR: 32037.14.aps.38.1968
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  • 用紫外光电子能谱研究了Al0.7Ga0.3As的表面态结构,观察到Al0.7Ga0.3As在价带中的两个表面态结构。在1500L原子氢吸附后消失。研究了这两个表面态结构在热退火消除表面损伤过程中的变化。结合LEED和XPS的实验结果,确定在450℃左右的热退火可以有效地消除损伤,获得一个完整的Al0.7Ga0.3As(100)表面。

     

    The surface states of Al0.7Ga0.3 As(l00) were studied by ultraviolet photoelecton spectro-scopy. It was found that there exist two surface states on Al0.7Ga0.3 As (100) surface, which could be removed by the adsorption of 1500 L hydrogen. The evolution of these two surface states with thermal annealing was investigated. Combining with the experimental results of LEED and XPS, it was recognized that the damage of surface could be removed effectively by a thermal annealing at a temperature near 450℃, and a nearly perfect surface of A10.7Ga0.3 As(l00) could be obtained.

     

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