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低温下水汽在Si(111)7×7表面上的化学吸附

物理学报, 1989, 38(2): 296-300.
DOI: 10.7498/aps.38.296
CSTR: 32037.14.aps.38.296

CHEMISORPTION OF H2O ON Si(111)7×7 SURFACE AT LOW TEMPERATURES

Acta Phys. Sin., 1989, 38(2): 296-300.
DOI: 10.7498/aps.38.296
CSTR: 32037.14.aps.38.296
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  • 摘要

    用ELS和XPS研究了低温下水汽在Si(111)7×7表面上的化学吸附及其随退火温度的变化。150K低温下水以解离形式吸附在Si(111)7×7表面。

     

    Abstract

    The chemisorption of water vapor on Si(111)7×7 surface at low temperatures and the effect of annealing were studied, with X-ray photoelectron spectroscopy and energy loss spectroscopy. It was found that the water molecules taken up on the Si(111)7×7 surface were dissociative at 150 K.

     

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