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中国物理学会期刊

类金刚石膜不同能量下的离子注入

CSTR: 32037.14.aps.39.420

DIAMOND-LIKE CARBON FILMS IMPLANTED WITH VARIOUS ION ENERGY

CSTR: 32037.14.aps.39.420
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  • 本文对等离子体气相沉积法制备的类金刚石膜(a-C:H)进行了离子注入研究。注入剂量固定为5×105Ar/cm2,注入能量分别为50,100,140和180keV。离子注入前后分别作了红外吸收谱,Raman谱,光学能隙,氢含量和电阻率的测量。结果表明,注入离子破坏了膜中的C—H键,sp2和sp3态都减少,而(sp2/sp3)比值增大;光学能隙Eopt,电阻

     

    Diamond-like carbon (DLC) films, prepared by RF plasma CVD, were implanted at a dose of 5×1015Ar/cm2 with various ion energy of 50, 100, 140, 180 keV. Before and after ion implantation, IR absorption spectra, Raman spectra, optical gap Eopt, hydrogen contents and resistivities were measured. The results show that C-H bonds are destroyed and sp2 and sp3 components are decreased during implantation. While the ratio of (sp2/sp3) increases with ion energy. The Eopt, resistivities and hydrogen contents decrease with ion energy increasing. Ho-wever, at 180 keV, the above parameters have no evident change. These results are also discussed in this paper.

     

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