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本文应用原位电子自旋共振(ESR)技术研究了射频反应溅射法制备的氢化非晶锗碳(a-Ge1-xCx:H)薄膜中自旋缺陷态的种类、密度、温度依赖关系和热力学动态行为。在分解ESR谱的过程中,发现了它的不对称成分,并对此进行了定量分析和微观机理的探讨。Using in situ electron spin resonance(ESR) technique, we have studied the type, the density, the temperature dependence and the thermal dynamic behavior of defects in rf-reactively sputtered a-Ge1-xCx: H films. In the decomposition process of the ESR spectra, we found that the spectra have an asymmetrical component. Quantitative analysis of the component and the explanation of its origin are given.







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