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中国物理学会期刊

用反应离子刻蚀制备的纯位相片将高斯型激光束变换为均匀束

CSTR: 32037.14.aps.41.1961

GAUSSIAN-TO-UNIFORM BEAM CONVERSION WITH PHASE-ONLY MASKS MADE BY REACTIVE ION-ETCHING

CSTR: 32037.14.aps.41.1961
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  • 用光学变换一般理论设计出仅用两个纯位相片构成的光学系统可以将高斯型激光束变换为均匀束。本文对两个纯位相片的位相分布函数进行了计算并设计出10台阶量化的纯位相片。制备纯位相片的方法是采用超大规模集成电路中微细加工技术。实验结果表明能量转换效率高于95%,输出波形与理论计算一致。

     

    The general optical transformation theory is used for the design for converting Gaussian laser beam into a uniform profile. The transformation system can be achieved with two phase-only masks system. The phase-only mask may be fabricated with reactive ion-etching on a quartz plate. Experimenra) results indicate that the output beam profile is consistent with the theoretical calculation. The conversion efficiency is higher than 95%.

     

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