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反应溅射a-Si:H/a-Ge:H超晶格的热稳定性

物理学报, 1992, 41(2): 302-305.
DOI: 10.7498/aps.41.302
CSTR: 32037.14.aps.41.302

INVESTIGATION ON THERMAL STABILITY OF REACTIVE- SPUTTERING a-Si:H/a-Ge:H SUPERLATTICES

Acta Phys. Sin., 1992, 41(2): 302-305.
DOI: 10.7498/aps.41.302
CSTR: 32037.14.aps.41.302
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  • 摘要

    通过红外透射谱和X射线衍射谱研究a-si:H/a-Ge:H超晶格的热稳定性,发现当周期厚度较小时,超晶格的晶化温度比体膜a-Ge:H的大,对实验结果作初步讨论。

     

    Abstract

    The thermal stability of a-Si:H/a-Ge:H superlattices was studied using LR and XRD spec tra. It was found that the crystallization temperature of superlattices with small layer thickness is higher than that of bulk a-Ge:H. Results are discussed preliminarily.

     

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