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中国物理学会期刊

化学腐蚀和硫处理对InSb(111)表面的影响

CSTR: 32037.14.aps.41.675

INFLUENCE OF CHEMICAL ETCHING AND SULFIDE TREATMENT ON InSb(111) SURFACES

CSTR: 32037.14.aps.41.675
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  • 本文应用俄歇电子能谱和X射线光电子能谱对化学腐蚀和硫处理的InSb表面进行了研究。实验中发现经过CP-4腐蚀以后在样品的表面生成了InSb的氧化层,氧化层中的组分是锑的氧化物明显多于铟的氧化物。样品经过硫处理以后能够除去InSb表面的氧化层并且形成硫化物钝化层。

     

    The chemical etched and (NH4)2S-treated InSb(lll) surfaces have been studied using Auger electron spectroscopy and X-ray phctoelectron spectroscopy. It is found that after etching in the CP-4 solution the InSb surfaces are covered by a native oxide overlayer in which the amounts of Sb oxide are obviously more than In oxide. The native oxide layer on the InSb surfaces is completely removed by sulfide treatment and then a sulfide passivation layer forms on the sample surfaces.

     

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